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Title: Magnetron with flux switching cathode and method of operation

Abstract

A magnetron sputtering apparatus is formed with a plurality of cells each for generating an independent magnetic field within a different region in the chamber of the apparatus. Each magnetic field aids in maintaining an ion plasma in the respective region of the chamber. One of a plurality of sputtering material targets is positioned on an electrode adjacent to each region so that said ions strike the target ejecting some of the target material. By selectively generating each magnetic field, the ion plasma may be moved from region to region to sputter material from different targets. The sputtered material becomes deposited on a substrate mounted on another electrode within the chamber. The duty cycle of each cell can be dynamically varied during the deposition to produce a layer having a graded composition throughout its thickness. 5 figs.

Inventors:
;
Issue Date:
OSTI Identifier:
7018784
Patent Number(s):
4865710 A
Application Number:
PPN: US 7-175711
Assignee:
Wisconsin Alumni Research Foundation, Madison, WI (United States) PTO; EDB-94-117938
DOE Contract Number:  
FG02-84ER45096
Resource Type:
Patent
Resource Relation:
Patent File Date: 31 Mar 1988
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; 36 MATERIALS SCIENCE; MAGNETRONS; DESIGN; OPERATION; MATERIALS; SPUTTERING; DEPOSITION; PLASMA; ELECTRON TUBES; ELECTRONIC EQUIPMENT; EQUIPMENT; MICROWAVE EQUIPMENT; MICROWAVE TUBES; 426000* - Engineering- Components, Electron Devices & Circuits- (1990-); 360101 - Metals & Alloys- Preparation & Fabrication; 360201 - Ceramics, Cermets, & Refractories- Preparation & Fabrication; 360601 - Other Materials- Preparation & Manufacture

Citation Formats

Aaron, D.B., and Wiley, J.D. Magnetron with flux switching cathode and method of operation. United States: N. p., 1989. Web.
Aaron, D.B., & Wiley, J.D. Magnetron with flux switching cathode and method of operation. United States.
Aaron, D.B., and Wiley, J.D. Tue . "Magnetron with flux switching cathode and method of operation". United States.
@article{osti_7018784,
title = {Magnetron with flux switching cathode and method of operation},
author = {Aaron, D.B. and Wiley, J.D.},
abstractNote = {A magnetron sputtering apparatus is formed with a plurality of cells each for generating an independent magnetic field within a different region in the chamber of the apparatus. Each magnetic field aids in maintaining an ion plasma in the respective region of the chamber. One of a plurality of sputtering material targets is positioned on an electrode adjacent to each region so that said ions strike the target ejecting some of the target material. By selectively generating each magnetic field, the ion plasma may be moved from region to region to sputter material from different targets. The sputtered material becomes deposited on a substrate mounted on another electrode within the chamber. The duty cycle of each cell can be dynamically varied during the deposition to produce a layer having a graded composition throughout its thickness. 5 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1989},
month = {9}
}