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Title: Process for etching mixed metal oxides

An etching process is described using dicarboxylic and tricarboxylic acids as chelating etchants for mixed metal oxide films such as high temperature superconductors and ferroelectric materials. Undesirable differential etching rates between different metal oxides are avoided by selection of the proper acid or combination of acids. Feature sizes below one micron, excellent quality vertical edges, and film thicknesses in the 100 Angstrom range may be achieved by this method. 1 fig.
Inventors:
;
Issue Date:
OSTI Identifier:
6996940
Assignee:
Sandia Corp., Albuquerque, NM (United States) SNL; EDB-94-167712
Patent Number(s):
US 5356516; A
Application Number:
PPN: US 8-023286
Contract Number:
AC04-76DP00789
Resource Relation:
Patent File Date: 26 Feb 1993
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; FERROELECTRIC MATERIALS; ETCHING; HIGH-TC SUPERCONDUCTORS; CARBOXYLIC ACIDS; THIN FILMS; FILMS; ORGANIC ACIDS; ORGANIC COMPOUNDS; SUPERCONDUCTORS; SURFACE FINISHING; 360601* - Other Materials- Preparation & Manufacture