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Title: Photoresist laminate

Abstract

The disclosure relates to a laminated negative dry-film photoresist for the production of thick, as well as thin, patterns with vertical sidewalls. Uniform depthwise exposure in a photoresist layer is effected by the use of an ultraviolet filtering top layer.

Inventors:
;
Issue Date:
OSTI Identifier:
6927366
Assignee:
Dept. of Energy TIC; ERA-06-004066; EDB-81-002008
DOE Contract Number:  
AT(29-1)-789
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; PHOTORESISTORS; DESIGN; FABRICATION; ECONOMICS; FILMS; IMAGES; MATERIALS TESTING; MYLAR; POLYETHYLENES; POLYMERS; PRINTED CIRCUITS; ULTRAVIOLET RADIATION; VISIBLE RADIATION; ELECTRICAL EQUIPMENT; ELECTROMAGNETIC RADIATION; ELECTRONIC CIRCUITS; EQUIPMENT; ESTERS; ORGANIC COMPOUNDS; ORGANIC POLYMERS; PETROCHEMICALS; PETROLEUM PRODUCTS; PLASTICS; POLYESTERS; POLYOLEFINS; RADIATIONS; RESISTORS; TESTING 420800* -- Engineering-- Electronic Circuits & Devices-- (-1989)

Citation Formats

Andrade, A.D., and Galbraith, L.K. Photoresist laminate. United States: N. p., 1979. Web.
Andrade, A.D., & Galbraith, L.K. Photoresist laminate. United States.
Andrade, A.D., and Galbraith, L.K. Mon . "Photoresist laminate". United States.
@article{osti_6927366,
title = {Photoresist laminate},
author = {Andrade, A.D. and Galbraith, L.K.},
abstractNote = {The disclosure relates to a laminated negative dry-film photoresist for the production of thick, as well as thin, patterns with vertical sidewalls. Uniform depthwise exposure in a photoresist layer is effected by the use of an ultraviolet filtering top layer.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1979},
month = {10}
}