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Title: Laser-driven fusion etching process

Abstract

The surfaces of solids are etched by a radiation-driven chemical reaction. The process involves exposing a substrate coated with a layer of a reactant material on its surface to radiation, e.g., a laser, to induce localized melting of the substrate which results in the occurrence of a fusion reaction between the substrate and coating material. The resultant reaction product and excess reactant salt are then removed from the surface of the substrate with a solvent which is relatively inert towards the substrate. The laser-driven chemical etching process is especially suitable for etching ionic substrates, e.g., LiNbO/sub 3/, such as used in electro-optical/acousto-optic devices. It is also suitable for applications wherein the etching process is required to produce an etched ionic substrate having a smooth surface morphology or when a very rapid etching rate is desired.

Inventors:
; ;
Issue Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
OSTI Identifier:
6743626
Patent Number(s):
6089206
Assignee:
SNL; ERA-14-001153; EDB-88-184934
Patent Classifications (CPCs):
F - MECHANICAL ENGINEERING F02 - COMBUSTION ENGINES F02D - CONTROLLING COMBUSTION ENGINES
F - MECHANICAL ENGINEERING F02 - COMBUSTION ENGINES F02P - IGNITION, OTHER THAN COMPRESSION IGNITION, FOR INTERNAL-COMBUSTION ENGINES
DOE Contract Number:  
AC04-76DP00789
Resource Type:
Patent
Resource Relation:
Other Information: Portions of this document are illegible in microfiche products
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; LASER RADIATION; USES; LITHIUM OXIDES; ETCHING; NIOBATES; SUBSTRATES; TANTALUM OXIDES; CHEMICAL REACTIONS; COATINGS; INVENTIONS; RADIATION EFFECTS; ALKALI METAL COMPOUNDS; CHALCOGENIDES; ELECTROMAGNETIC RADIATION; LITHIUM COMPOUNDS; NIOBIUM COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; RADIATIONS; REFRACTORY METAL COMPOUNDS; SURFACE FINISHING; TANTALUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; 360601* - Other Materials- Preparation & Manufacture; 360605 - Materials- Radiation Effects

Citation Formats

Ashby, C I.H., Brannon, P J, and Gerardo, J B. Laser-driven fusion etching process. United States: N. p., 1987. Web.
Ashby, C I.H., Brannon, P J, & Gerardo, J B. Laser-driven fusion etching process. United States.
Ashby, C I.H., Brannon, P J, and Gerardo, J B. Tue . "Laser-driven fusion etching process". United States.
@article{osti_6743626,
title = {Laser-driven fusion etching process},
author = {Ashby, C I.H. and Brannon, P J and Gerardo, J B},
abstractNote = {The surfaces of solids are etched by a radiation-driven chemical reaction. The process involves exposing a substrate coated with a layer of a reactant material on its surface to radiation, e.g., a laser, to induce localized melting of the substrate which results in the occurrence of a fusion reaction between the substrate and coating material. The resultant reaction product and excess reactant salt are then removed from the surface of the substrate with a solvent which is relatively inert towards the substrate. The laser-driven chemical etching process is especially suitable for etching ionic substrates, e.g., LiNbO/sub 3/, such as used in electro-optical/acousto-optic devices. It is also suitable for applications wherein the etching process is required to produce an etched ionic substrate having a smooth surface morphology or when a very rapid etching rate is desired.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1987},
month = {8}
}