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Title: Regenerative switching CMOS system

Abstract

Complementary Metal Oxide Semiconductor (CMOS) Schottky barrier Field Effect Transistor systems, which are a series combination of N and P-Channel MOSFETS, in which Source Schottky barrier junctions of the N and P-Channel Schottky barrier MOSFETS are electrically interconnected, (rather than the Drains as in conventional diffused junction CMOS), which Schottky barrier MOSFET system demonstrates Regenerative Inverting Switching Characteristics in use are disclosed. Both the N and P-Channel Schottky barrier MOSFET devices are unique in that they provide operational Drain Current vs. Drain to Source voltage as a function of Gate voltage only where the polarities of the Drain voltage and Gate voltage are opposite, referenced to the Source as a common terminal, and where the polarity of the voltage applied to the Gate is appropriate to cause Channel inversion. Experimentally derived results which demonstrate and verify the operation of N and P-Channel Schottky barrier MOSFETS actually fabricated on P and N-type Silicon respectively, by a common procedure using vacuum deposited Chromium as a Schottky barrier forming metal, are also provided. 14 figs.

Inventors:
Issue Date:
Research Org.:
James D Welch
Sponsoring Org.:
USDOE, Washington, DC (United States)
OSTI Identifier:
672616
Patent Number(s):
5760449
Application Number:
PAN: 8-578,336
Assignee:
KCSO; SCA: 426000; PA: EDB-98:120802; SN: 98002024924
DOE Contract Number:  
FG47-93R701314
Resource Type:
Patent
Resource Relation:
Other Information: PBD: 2 Jun 1998
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; MOSFET; SCHOTTKY BARRIER DIODES; ELECTRICAL PROPERTIES; DESIGN; OPERATION; N-TYPE CONDUCTORS; P-TYPE CONDUCTORS

Citation Formats

Welch, J D. Regenerative switching CMOS system. United States: N. p., 1998. Web.
Welch, J D. Regenerative switching CMOS system. United States.
Welch, J D. Tue . "Regenerative switching CMOS system". United States.
@article{osti_672616,
title = {Regenerative switching CMOS system},
author = {Welch, J D},
abstractNote = {Complementary Metal Oxide Semiconductor (CMOS) Schottky barrier Field Effect Transistor systems, which are a series combination of N and P-Channel MOSFETS, in which Source Schottky barrier junctions of the N and P-Channel Schottky barrier MOSFETS are electrically interconnected, (rather than the Drains as in conventional diffused junction CMOS), which Schottky barrier MOSFET system demonstrates Regenerative Inverting Switching Characteristics in use are disclosed. Both the N and P-Channel Schottky barrier MOSFET devices are unique in that they provide operational Drain Current vs. Drain to Source voltage as a function of Gate voltage only where the polarities of the Drain voltage and Gate voltage are opposite, referenced to the Source as a common terminal, and where the polarity of the voltage applied to the Gate is appropriate to cause Channel inversion. Experimentally derived results which demonstrate and verify the operation of N and P-Channel Schottky barrier MOSFETS actually fabricated on P and N-type Silicon respectively, by a common procedure using vacuum deposited Chromium as a Schottky barrier forming metal, are also provided. 14 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1998},
month = {6}
}