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Title: Carbon or boron modified titanium silicide

Abstract

A titanium silicide material based on Ti{sub 5}Si{sub 3} intermetallic compound exhibits substantially improved oxidative stability at elevated temperatures. In particular, carbon is added to a Ti{sub 5}Si{sub 3} base material in an amount (e.g. about 0.3 to about 3.6 weight % C) effective to impart substantially improved oxidative stability at elevated temperatures, such as about 1000 C. Boron is added to a Ti{sub 5}Si{sub 3} base material in an amount (e.g. about 0.3 to about 3.3 weight % B) to this same end. 3 figs.

Inventors:
;
Issue Date:
Research Org.:
Iowa State Univ., Ames, IA (United States)
Sponsoring Org.:
USDOE, Washington, DC (United States); Department of Commerce, Washington, DC (United States)
OSTI Identifier:
672501
Patent Number(s):
5779823
Application Number:
PAN: 8-698,507; CNN: Grant ITA 87-02
Assignee:
Iowa State Univ. Research Foundation, Inc., Ames, IA (United States)
DOE Contract Number:  
W-7405-ENG-82
Resource Type:
Patent
Resource Relation:
Other Information: PBD: 14 Jul 1998
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; TITANIUM SILICIDES; INTERMETALLIC COMPOUNDS; CORROSION RESISTANCE; OXIDATION; CARBON; METALLURGICAL EFFECTS; BORON

Citation Formats

Thom, A J, and Akinc, M. Carbon or boron modified titanium silicide. United States: N. p., 1998. Web.
Thom, A J, & Akinc, M. Carbon or boron modified titanium silicide. United States.
Thom, A J, and Akinc, M. Tue . "Carbon or boron modified titanium silicide". United States.
@article{osti_672501,
title = {Carbon or boron modified titanium silicide},
author = {Thom, A J and Akinc, M},
abstractNote = {A titanium silicide material based on Ti{sub 5}Si{sub 3} intermetallic compound exhibits substantially improved oxidative stability at elevated temperatures. In particular, carbon is added to a Ti{sub 5}Si{sub 3} base material in an amount (e.g. about 0.3 to about 3.6 weight % C) effective to impart substantially improved oxidative stability at elevated temperatures, such as about 1000 C. Boron is added to a Ti{sub 5}Si{sub 3} base material in an amount (e.g. about 0.3 to about 3.3 weight % B) to this same end. 3 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1998},
month = {7}
}

Patent:
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