Carbon or boron modified titanium silicide
Abstract
A titanium silicide material based on Ti{sub 5}Si{sub 3} intermetallic compound exhibits substantially improved oxidative stability at elevated temperatures. In particular, carbon is added to a Ti{sub 5}Si{sub 3} base material in an amount (e.g. about 0.3 to about 3.6 weight % C) effective to impart substantially improved oxidative stability at elevated temperatures, such as about 1000 C. Boron is added to a Ti{sub 5}Si{sub 3} base material in an amount (e.g. about 0.3 to about 3.3 weight % B) to this same end. 3 figs.
- Inventors:
- Issue Date:
- Research Org.:
- Iowa State Univ., Ames, IA (United States)
- Sponsoring Org.:
- USDOE, Washington, DC (United States); Department of Commerce, Washington, DC (United States)
- OSTI Identifier:
- 672501
- Patent Number(s):
- 5779823
- Application Number:
- PAN: 8-698,507; CNN: Grant ITA 87-02
- Assignee:
- Iowa State Univ. Research Foundation, Inc., Ames, IA (United States)
- DOE Contract Number:
- W-7405-ENG-82
- Resource Type:
- Patent
- Resource Relation:
- Other Information: PBD: 14 Jul 1998
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; TITANIUM SILICIDES; INTERMETALLIC COMPOUNDS; CORROSION RESISTANCE; OXIDATION; CARBON; METALLURGICAL EFFECTS; BORON
Citation Formats
Thom, A J, and Akinc, M. Carbon or boron modified titanium silicide. United States: N. p., 1998.
Web.
Thom, A J, & Akinc, M. Carbon or boron modified titanium silicide. United States.
Thom, A J, and Akinc, M. Tue .
"Carbon or boron modified titanium silicide". United States.
@article{osti_672501,
title = {Carbon or boron modified titanium silicide},
author = {Thom, A J and Akinc, M},
abstractNote = {A titanium silicide material based on Ti{sub 5}Si{sub 3} intermetallic compound exhibits substantially improved oxidative stability at elevated temperatures. In particular, carbon is added to a Ti{sub 5}Si{sub 3} base material in an amount (e.g. about 0.3 to about 3.6 weight % C) effective to impart substantially improved oxidative stability at elevated temperatures, such as about 1000 C. Boron is added to a Ti{sub 5}Si{sub 3} base material in an amount (e.g. about 0.3 to about 3.3 weight % B) to this same end. 3 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1998},
month = {7}
}