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Title: Fluorination of amorphous thin-film materials with xenon fluoride

Abstract

A method is disclosed for producing fluorine-containing amorphous semiconductor material, preferably comprising amorphous silicon. The method includes depositing amorphous thin-film material onto a substrate while introducing xenon fluoride during the film deposition process.

Inventors:
Issue Date:
Research Org.:
Solar Energy Research Inst. (SERI), Golden, CO (United States)
OSTI Identifier:
6710874
Patent Number(s):
6045920
Application Number:
ON: DE89000211
Assignee:
Dept. of Energy
Patent Classifications (CPCs):
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
G - PHYSICS G03 - PHOTOGRAPHY G03G - ELECTROGRAPHY
DOE Contract Number:  
AC02-83CH10093
Resource Type:
Patent
Resource Relation:
Other Information: Portions of this document are illegible in microfiche products
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; SEMICONDUCTOR MATERIALS; FLUORINATION; AMORPHOUS STATE; DEPOSITION; DESIGN; INVENTIONS; THIN FILMS; XENON FLUORIDES; CHEMICAL REACTIONS; FILMS; FLUORIDES; FLUORINE COMPOUNDS; HALIDES; HALOGEN COMPOUNDS; HALOGENATION; MATERIALS; RARE GAS COMPOUNDS; XENON COMPOUNDS; 360601* - Other Materials- Preparation & Manufacture

Citation Formats

Weil, R B. Fluorination of amorphous thin-film materials with xenon fluoride. United States: N. p., 1987. Web.
Weil, R B. Fluorination of amorphous thin-film materials with xenon fluoride. United States.
Weil, R B. Fri . "Fluorination of amorphous thin-film materials with xenon fluoride". United States.
@article{osti_6710874,
title = {Fluorination of amorphous thin-film materials with xenon fluoride},
author = {Weil, R B},
abstractNote = {A method is disclosed for producing fluorine-containing amorphous semiconductor material, preferably comprising amorphous silicon. The method includes depositing amorphous thin-film material onto a substrate while introducing xenon fluoride during the film deposition process.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1987},
month = {5}
}