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Title: Fabrication process for a gradient index x-ray lens

Abstract

A process is disclosed for fabricating high efficiency x-ray lenses that operate in the 0.5-4.0 keV region suitable for use in biological imaging, surface science, and x-ray lithography of integrated circuits. The gradient index x-ray optics fabrication process broadly involves co-sputtering multi-layers of film on a wire, followed by slicing and mounting on block, and then ion beam thinning to a thickness determined by periodic testing for efficiency. The process enables the fabrication of transmissive gradient index x-ray optics for the 0.5-4.0 keV energy range. This process allows the fabrication of optical elements for the next generation of imaging and x-ray lithography instruments in the soft x-ray region. 13 figures.

Inventors:
; ;
Issue Date:
OSTI Identifier:
6615994
Patent Number(s):
5382342 A
Application Number:
PPN: US 8-004767
Assignee:
Dept. of Energy, Washington, DC (United States)
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Resource Relation:
Patent File Date: 14 Jan 1993
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; LENSES; FABRICATION; BIOLOGY; INTEGRATED CIRCUITS; LAYERS; SOFT X RADIATION; SURFACES; USES; ELECTROMAGNETIC RADIATION; ELECTRONIC CIRCUITS; IONIZING RADIATIONS; MICROELECTRONIC CIRCUITS; RADIATIONS; X RADIATION; 420200* - Engineering- Facilities, Equipment, & Techniques

Citation Formats

Bionta, R M, Makowiecki, D M, and Skulina, K M. Fabrication process for a gradient index x-ray lens. United States: N. p., 1995. Web.
Bionta, R M, Makowiecki, D M, & Skulina, K M. Fabrication process for a gradient index x-ray lens. United States.
Bionta, R M, Makowiecki, D M, and Skulina, K M. Tue . "Fabrication process for a gradient index x-ray lens". United States.
@article{osti_6615994,
title = {Fabrication process for a gradient index x-ray lens},
author = {Bionta, R M and Makowiecki, D M and Skulina, K M},
abstractNote = {A process is disclosed for fabricating high efficiency x-ray lenses that operate in the 0.5-4.0 keV region suitable for use in biological imaging, surface science, and x-ray lithography of integrated circuits. The gradient index x-ray optics fabrication process broadly involves co-sputtering multi-layers of film on a wire, followed by slicing and mounting on block, and then ion beam thinning to a thickness determined by periodic testing for efficiency. The process enables the fabrication of transmissive gradient index x-ray optics for the 0.5-4.0 keV energy range. This process allows the fabrication of optical elements for the next generation of imaging and x-ray lithography instruments in the soft x-ray region. 13 figures.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1995},
month = {1}
}