Virtually distortion-free imaging system for large field, high resolution lithography
Abstract
Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position.
- Inventors:
- Issue Date:
- OSTI Identifier:
- 6291152
- Patent Number(s):
- 5176970
- Application Number:
- PPN: US 7-597968
- Assignee:
- Dept. of Energy, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 12 Oct 1990
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 42 ENGINEERING; INTEGRATED CIRCUITS; MASKING; OPTICAL SYSTEMS; DESIGN; IMAGES; POSITIONING; SPATIAL RESOLUTION; ELECTRONIC CIRCUITS; MICROELECTRONIC CIRCUITS; RESOLUTION; 426000* - Engineering- Components, Electron Devices & Circuits- (1990-)
Citation Formats
Hawryluk, A M, and Ceglio, N M. Virtually distortion-free imaging system for large field, high resolution lithography. United States: N. p., 1993.
Web.
Hawryluk, A M, & Ceglio, N M. Virtually distortion-free imaging system for large field, high resolution lithography. United States.
Hawryluk, A M, and Ceglio, N M. Tue .
"Virtually distortion-free imaging system for large field, high resolution lithography". United States.
@article{osti_6291152,
title = {Virtually distortion-free imaging system for large field, high resolution lithography},
author = {Hawryluk, A M and Ceglio, N M},
abstractNote = {Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1993},
month = {1}
}
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