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Title: Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams

Abstract

Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position. Particle beams, including electrons, ions and neutral particles, may be used as well as electromagnetic radiation.

Inventors:
;
Issue Date:
OSTI Identifier:
6229628
Patent Number(s):
5178974 A
Application Number:
CNN: N00024-79-C4026; PPN: US 7-683011
Assignee:
Dept. of Energy, Washington, DC (United States)
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Resource Relation:
Patent File Date: 10 Apr 1991
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; INTEGRATED CIRCUITS; MASKING; ELECTROMAGNETIC RADIATION; IMAGES; OPTICAL SYSTEMS; PARTICLE BEAMS; SCREEN PRINTING; SPATIAL RESOLUTION; BEAMS; DEPOSITION; ELECTRONIC CIRCUITS; MICROELECTRONIC CIRCUITS; RADIATIONS; RESOLUTION; SURFACE COATING; 426000* - Engineering- Components, Electron Devices & Circuits- (1990-)

Citation Formats

Hawryluk, A M, and Ceglio, N M. Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams. United States: N. p., 1993. Web.
Hawryluk, A M, & Ceglio, N M. Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams. United States.
Hawryluk, A M, and Ceglio, N M. Tue . "Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams". United States.
@article{osti_6229628,
title = {Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams},
author = {Hawryluk, A M and Ceglio, N M},
abstractNote = {Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position. Particle beams, including electrons, ions and neutral particles, may be used as well as electromagnetic radiation.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1993},
month = {1}
}