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Title: Polysilane positive photoresist materials and methods for their use

Abstract

New polysilane copolymers comprise recurring units of -Si(X)(Y)- and Si(A)(B)-, Si(X)(Y) being different from Si(A)(B). X and Y together have 1 to 13 carbon atoms, and X and Y each independently is hydrogen, alkyl, cycloalkyl, phenyl, alkylphenyl, or phenylalkyl, with the proviso that only one of X and Y contains a phenyl moiety, or together X and Y are an alkylene group forming a ring with the adjoining Si atom. A and B together have 3 to 13 carbon atoms, and A and B each independently is alkyl or cycloalkyl, with the proviso that when one of A and B is ethyl, the other is not methyl or ethyl, and that when one of A and B is n-propyl and the other is methyl, X and Y are not both methyl. Corresponding homopolysilanes are also provided. Upon ultraviolet irradiation, they photodepolymerize to form volatile products. As a result, they represent a new class of photoresists which enable direct formation of a positive image eliminating the heretofore required development step.

Inventors:
;
Issue Date:
OSTI Identifier:
6121215
Application Number:
ON: TI85005743
Assignee:
Dept. of Energy SNL; EDB-85-038323
DOE Contract Number:  
AC04-76DP00789
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; SILANES; POLYMERS; COPOLYMERS; DEPOLYMERIZATION; MICROELECTRONICS; POLYMERIZATION; ULTRAVIOLET RADIATION; CHEMICAL REACTIONS; DECOMPOSITION; ELECTROMAGNETIC RADIATION; HYDRIDES; HYDROGEN COMPOUNDS; ORGANIC COMPOUNDS; ORGANIC POLYMERS; ORGANIC SILICON COMPOUNDS; RADIATIONS; SILICON COMPOUNDS; 360400* - Polymers & Plastics- (-1987)

Citation Formats

Harrah, L.A., and Zeigler, J.M. Polysilane positive photoresist materials and methods for their use. United States: N. p., 1984. Web.
Harrah, L.A., & Zeigler, J.M. Polysilane positive photoresist materials and methods for their use. United States.
Harrah, L.A., and Zeigler, J.M. Thu . "Polysilane positive photoresist materials and methods for their use". United States.
@article{osti_6121215,
title = {Polysilane positive photoresist materials and methods for their use},
author = {Harrah, L.A. and Zeigler, J.M.},
abstractNote = {New polysilane copolymers comprise recurring units of -Si(X)(Y)- and Si(A)(B)-, Si(X)(Y) being different from Si(A)(B). X and Y together have 1 to 13 carbon atoms, and X and Y each independently is hydrogen, alkyl, cycloalkyl, phenyl, alkylphenyl, or phenylalkyl, with the proviso that only one of X and Y contains a phenyl moiety, or together X and Y are an alkylene group forming a ring with the adjoining Si atom. A and B together have 3 to 13 carbon atoms, and A and B each independently is alkyl or cycloalkyl, with the proviso that when one of A and B is ethyl, the other is not methyl or ethyl, and that when one of A and B is n-propyl and the other is methyl, X and Y are not both methyl. Corresponding homopolysilanes are also provided. Upon ultraviolet irradiation, they photodepolymerize to form volatile products. As a result, they represent a new class of photoresists which enable direct formation of a positive image eliminating the heretofore required development step.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1984},
month = {4}
}