Polysilane positive photoresist materials and methods for their use
Abstract
New polysilane copolymers comprise recurring units of -Si(X)(Y)- and Si(A)(B)-, Si(X)(Y) being different from Si(A)(B). X and Y together have 1 to 13 carbon atoms, and X and Y each independently is hydrogen, alkyl, cycloalkyl, phenyl, alkylphenyl, or phenylalkyl, with the proviso that only one of X and Y contains a phenyl moiety, or together X and Y are an alkylene group forming a ring with the adjoining Si atom. A and B together have 3 to 13 carbon atoms, and A and B each independently is alkyl or cycloalkyl, with the proviso that when one of A and B is ethyl, the other is not methyl or ethyl, and that when one of A and B is n-propyl and the other is methyl, X and Y are not both methyl. Corresponding homopolysilanes are also provided. Upon ultraviolet irradiation, they photodepolymerize to form volatile products. As a result, they represent a new class of photoresists which enable direct formation of a positive image eliminating the heretofore required development step.
- Inventors:
- Issue Date:
- OSTI Identifier:
- 6121215
- Application Number:
- ON: TI85005743
- Assignee:
- Dept. of Energy
- DOE Contract Number:
- AC04-76DP00789
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; SILANES; POLYMERS; COPOLYMERS; DEPOLYMERIZATION; MICROELECTRONICS; POLYMERIZATION; ULTRAVIOLET RADIATION; CHEMICAL REACTIONS; DECOMPOSITION; ELECTROMAGNETIC RADIATION; HYDRIDES; HYDROGEN COMPOUNDS; ORGANIC COMPOUNDS; ORGANIC POLYMERS; ORGANIC SILICON COMPOUNDS; RADIATIONS; SILICON COMPOUNDS; 360400* - Polymers & Plastics- (-1987)
Citation Formats
Harrah, L A, and Zeigler, J M. Polysilane positive photoresist materials and methods for their use. United States: N. p., 1984.
Web.
Harrah, L A, & Zeigler, J M. Polysilane positive photoresist materials and methods for their use. United States.
Harrah, L A, and Zeigler, J M. Thu .
"Polysilane positive photoresist materials and methods for their use". United States.
@article{osti_6121215,
title = {Polysilane positive photoresist materials and methods for their use},
author = {Harrah, L A and Zeigler, J M},
abstractNote = {New polysilane copolymers comprise recurring units of -Si(X)(Y)- and Si(A)(B)-, Si(X)(Y) being different from Si(A)(B). X and Y together have 1 to 13 carbon atoms, and X and Y each independently is hydrogen, alkyl, cycloalkyl, phenyl, alkylphenyl, or phenylalkyl, with the proviso that only one of X and Y contains a phenyl moiety, or together X and Y are an alkylene group forming a ring with the adjoining Si atom. A and B together have 3 to 13 carbon atoms, and A and B each independently is alkyl or cycloalkyl, with the proviso that when one of A and B is ethyl, the other is not methyl or ethyl, and that when one of A and B is n-propyl and the other is methyl, X and Y are not both methyl. Corresponding homopolysilanes are also provided. Upon ultraviolet irradiation, they photodepolymerize to form volatile products. As a result, they represent a new class of photoresists which enable direct formation of a positive image eliminating the heretofore required development step.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Thu Apr 05 00:00:00 EST 1984},
month = {Thu Apr 05 00:00:00 EST 1984}
}