Phenolic dyes as nonbleachable absorbers compatible with novolac resins for linewidth control in photoresists
Abstract
Photoresist techniques and compositions are provided employing curcumin as an absorptive dye for the purpose of reducing linewidth non-uniformity caused by scattered and reflective light from the substrate-resist interface. The photoresist compositions containing curcumin as the absorptive dye are used in the production of microelectronic circuitry by both single layer and multilayer photoresist techniques.
- Inventors:
- Issue Date:
- Research Org.:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- OSTI Identifier:
- 6086684
- Application Number:
- ON: DE88000844
- Assignee:
- Dept. of Energy
- DOE Contract Number:
- AC04-76DP00789
- Resource Type:
- Patent
- Resource Relation:
- Other Information: Portions of this document are illegible in microfiche products
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 42 ENGINEERING; 36 MATERIALS SCIENCE; CURCUMIN; ABSORPTION; LINE WIDTHS; CONTROL; MICROELECTRONICS; RESINS; SPIN-ON COATING; BLEACHING; ETCHING; LAYERS; LIGHT SCATTERING; PHOTOSENSITIVITY; REFLECTION; RESOLUTION; ULTRAVIOLET RADIATION; AROMATICS; DEPOSITION; DYES; ELECTROMAGNETIC RADIATION; ETHERS; HYDROXY COMPOUNDS; KETONES; ORGANIC COMPOUNDS; ORGANIC OXYGEN COMPOUNDS; ORGANIC POLYMERS; PETROCHEMICALS; PETROLEUM PRODUCTS; PHENOLS; POLYMERS; POLYPHENOLS; RADIATIONS; SCATTERING; SENSITIVITY; SURFACE COATING; SURFACE FINISHING; 420800* - Engineering- Electronic Circuits & Devices- (-1989); 360603 - Materials- Properties; 360601 - Other Materials- Preparation & Manufacture
Citation Formats
Renschler, C L. Phenolic dyes as nonbleachable absorbers compatible with novolac resins for linewidth control in photoresists. United States: N. p., 1986.
Web.
Renschler, C L. Phenolic dyes as nonbleachable absorbers compatible with novolac resins for linewidth control in photoresists. United States.
Renschler, C L. Tue .
"Phenolic dyes as nonbleachable absorbers compatible with novolac resins for linewidth control in photoresists". United States.
@article{osti_6086684,
title = {Phenolic dyes as nonbleachable absorbers compatible with novolac resins for linewidth control in photoresists},
author = {Renschler, C L},
abstractNote = {Photoresist techniques and compositions are provided employing curcumin as an absorptive dye for the purpose of reducing linewidth non-uniformity caused by scattered and reflective light from the substrate-resist interface. The photoresist compositions containing curcumin as the absorptive dye are used in the production of microelectronic circuitry by both single layer and multilayer photoresist techniques.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1986},
month = {11}
}
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