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Title: Removal of fluoride impurities from UF/sub 6/ gas

Abstract

A method of purifying a UF/sub 6/ gas stream containing one or more metal fluoride impurities composed of a transuranic metal, transition metal or mixtures thereof, is carried out by contacting the gas stream with a bed of UF/sub 5/ in a reaction vessel under conditions where at least one impurity reacts with the UF/sub 5/ to form a nongaseous product and a treated gas stream, and removing the treated gas stream from contact with the bed. The nongaseous products are subsequently removed in a reaction with an active fluorine affording agent to form a gaseous impurity which is removed from the reaction vessel. The bed of UF/sub 5/ is formed by the reduction of UF/sub 6/ in the presence of uv light. One embodiment of the reaction vessel includes a plurality of uv light sources as tubes on which UF/sub 5/ is formed. 2 figures.

Inventors:
Issue Date:
OSTI Identifier:
6002786
Application Number:
ON: TI85006514
Assignee:
Dept. of Energy
DOE Contract Number:  
W-31-109-ENG-38
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
11 NUCLEAR FUEL CYCLE AND FUEL MATERIALS; URANIUM HEXAFLUORIDE; PURIFICATION; FLUORIDES; GASES; IMPURITIES; REMOVAL; SEPARATION PROCESSES; TRANSITION ELEMENT COMPOUNDS; TRANSURANIUM COMPOUNDS; ACTINIDE COMPOUNDS; FLUIDS; FLUORINE COMPOUNDS; HALIDES; HALOGEN COMPOUNDS; URANIUM COMPOUNDS; URANIUM FLUORIDES; 050501* - Nuclear Fuels- Uranium Enrichment- Gaseous Diffusion- (-1989)

Citation Formats

Beitz, J V. Removal of fluoride impurities from UF/sub 6/ gas. United States: N. p., 1984. Web.
Beitz, J V. Removal of fluoride impurities from UF/sub 6/ gas. United States.
Beitz, J V. Fri . "Removal of fluoride impurities from UF/sub 6/ gas". United States.
@article{osti_6002786,
title = {Removal of fluoride impurities from UF/sub 6/ gas},
author = {Beitz, J V},
abstractNote = {A method of purifying a UF/sub 6/ gas stream containing one or more metal fluoride impurities composed of a transuranic metal, transition metal or mixtures thereof, is carried out by contacting the gas stream with a bed of UF/sub 5/ in a reaction vessel under conditions where at least one impurity reacts with the UF/sub 5/ to form a nongaseous product and a treated gas stream, and removing the treated gas stream from contact with the bed. The nongaseous products are subsequently removed in a reaction with an active fluorine affording agent to form a gaseous impurity which is removed from the reaction vessel. The bed of UF/sub 5/ is formed by the reduction of UF/sub 6/ in the presence of uv light. One embodiment of the reaction vessel includes a plurality of uv light sources as tubes on which UF/sub 5/ is formed. 2 figures.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Fri Jan 06 00:00:00 EST 1984},
month = {Fri Jan 06 00:00:00 EST 1984}
}

Patent:
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