Recovery of Mo/Si multilayer coated optical substrates

Baker, S L; Vernon, S P; Stearns, D G

Title: Recovery of Mo/Si multilayer coated optical substrates

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Abstract

Mo/Si multilayers are removed from superpolished ZERODUR and fused silica substrates with a dry etching process that, under suitable processing conditions, produces negligible change in either the substrate surface figure or surface roughness. The two step dry etching process removes SiO{sub 2} overlayer with a fluroine-containing gas and then moves molybdenum and silicon multilayers with a chlorine-containing gas. Full recovery of the initial normal incidence extreme ultra-violet (EUV) reflectance response has been demonstrated on reprocessed substrates. 5 figs.

Inventors:: Baker, S L; Vernon, S P; Stearns, D G

Issue Date:: 1997-12-16

Research Org.:: Univ. of California (United States)

Sponsoring Org.:: USDOE, Washington, DC (United States)

OSTI Identifier:: 563699

Patent Number(s):: 5698113

Application Number:: PAN: 8-607,055; TRN: 98:002118

Assignee:: Univ. of California, Oakland, CA (United States)

DOE Contract Number:: W-7405-ENG-48

Resource Type:: Patent

Resource Relation:: Other Information: PBD: 16 Dec 1997

Country of Publication:: United States

Language:: English

Subject:: 43 PARTICLE ACCELERATORS; OPTICAL SYSTEMS; MATERIALS RECOVERY; MOLYBDENUM; SILICON; EXTREME ULTRAVIOLET RADIATION; REMOVAL; OPTICAL PROPERTIES; ACCELERATOR FACILITIES; SYNCHROTRON RADIATION SOURCES; COATINGS

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                    Baker, S L, Vernon, S P, and Stearns, D G. Recovery of Mo/Si multilayer coated optical substrates.  United States: N. p., 1997. 
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                    Baker, S L, Vernon, S P, & Stearns, D G. Recovery of Mo/Si multilayer coated optical substrates.  United States.

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                    Baker, S L, Vernon, S P, and Stearns, D G. Tue .  
        "Recovery of Mo/Si multilayer coated optical substrates".  United States.

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@article{osti_563699,

  title        = {Recovery of Mo/Si multilayer coated optical substrates},

  author       = {Baker, S L and Vernon, S P and Stearns, D G},

  abstractNote = {Mo/Si multilayers are removed from superpolished ZERODUR and fused silica substrates with a dry etching process that, under suitable processing conditions, produces negligible change in either the substrate surface figure or surface roughness. The two step dry etching process removes SiO{sub 2} overlayer with a fluroine-containing gas and then moves molybdenum and silicon multilayers with a chlorine-containing gas. Full recovery of the initial normal incidence extreme ultra-violet (EUV) reflectance response has been demonstrated on reprocessed substrates. 5 figs.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1997},

  month        = {12}

}

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