Method and apparatus for conducting variable thickness vapor deposition
Abstract
A method of vapor depositing metal on a substrate in variable thickness comprises conducting the deposition continuously without interruption to avoid formation of grain boundaries. To achieve reduced deposition in specific regions a thin wire or ribbon blocking body is placed between source and substrate to partially block vapors from depositing in the region immediately below.
- Inventors:
- Issue Date:
- Research Org.:
- Mound Plant (MOUND), Miamisburg, OH (United States)
- OSTI Identifier:
- 5619782
- Application Number:
- ON: DE85011653
- Assignee:
- Dept. of Energy
- DOE Contract Number:
- AC04-76DP00053
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; METALS; DEPOSITION; VAPOR DEPOSITED COATINGS; COATINGS; ELEMENTS; 360101* - Metals & Alloys- Preparation & Fabrication
Citation Formats
Nesslage, G V. Method and apparatus for conducting variable thickness vapor deposition. United States: N. p., 1984.
Web.
Nesslage, G V. Method and apparatus for conducting variable thickness vapor deposition. United States.
Nesslage, G V. Fri .
"Method and apparatus for conducting variable thickness vapor deposition". United States.
@article{osti_5619782,
title = {Method and apparatus for conducting variable thickness vapor deposition},
author = {Nesslage, G V},
abstractNote = {A method of vapor depositing metal on a substrate in variable thickness comprises conducting the deposition continuously without interruption to avoid formation of grain boundaries. To achieve reduced deposition in specific regions a thin wire or ribbon blocking body is placed between source and substrate to partially block vapors from depositing in the region immediately below.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Fri Aug 03 00:00:00 EDT 1984},
month = {Fri Aug 03 00:00:00 EDT 1984}
}
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