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Title: Method and apparatus for conducting variable thickness vapor deposition

Abstract

A method of vapor depositing metal on a substrate in variable thickness comprises conducting the deposition continuously without interruption to avoid formation of grain boundaries. To achieve reduced deposition in specific regions a thin wire or ribbon blocking body is placed between source and substrate to partially block vapors from depositing in the region immediately below.

Inventors:
Issue Date:
Research Org.:
Monsanto Research Corp., Miamisburg, OH (USA). Mound
OSTI Identifier:
5619782
Application Number:
ON: DE85011653
Assignee:
Dept. of Energy
DOE Contract Number:  
AC04-76DP00053
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; METALS; DEPOSITION; VAPOR DEPOSITED COATINGS; COATINGS; ELEMENTS; 360101* - Metals & Alloys- Preparation & Fabrication

Citation Formats

Nesslage, G V. Method and apparatus for conducting variable thickness vapor deposition. United States: N. p., 1984. Web.
Nesslage, G V. Method and apparatus for conducting variable thickness vapor deposition. United States.
Nesslage, G V. Fri . "Method and apparatus for conducting variable thickness vapor deposition". United States.
@article{osti_5619782,
title = {Method and apparatus for conducting variable thickness vapor deposition},
author = {Nesslage, G V},
abstractNote = {A method of vapor depositing metal on a substrate in variable thickness comprises conducting the deposition continuously without interruption to avoid formation of grain boundaries. To achieve reduced deposition in specific regions a thin wire or ribbon blocking body is placed between source and substrate to partially block vapors from depositing in the region immediately below.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1984},
month = {8}
}