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Title: Chemical vapor deposition of sialon

Abstract

A laminated composite and a method for forming the composite by chemical vapor deposition are described. The composite includes a layer of sialon and a material to which the layer is bonded. The method includes the steps of exposing a surface of the material to an ammonia containing atmosphere; heating the surface to at least about 1200/sup 0/C; and impinging a gas containing N/sub 2/, SiCl/sub 4/, and AlCl/sub 3/ on the surface.

Inventors:
;
OSTI Identifier:
5417810
Assignee:
TIC; ERA-05-024425; EDB-80-067018
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ALUMINIUM CHLORIDES; SURFACE COATING; NITRIDES; REFRACTORY METALS; BONDING; ROTORS; POROSITY; SORPTIVE PROPERTIES; SILICON CHLORIDES; SILICON NITRIDES; CERAMICS; CHEMICAL VAPOR DEPOSITION; GRAPHITE; LAYERS; REFRACTORIES; ALUMINIUM COMPOUNDS; CARBON; CHEMICAL COATING; CHLORIDES; CHLORINE COMPOUNDS; DEPOSITION; ELEMENTS; FABRICATION; HALIDES; HALOGEN COMPOUNDS; JOINING; METALS; NITROGEN COMPOUNDS; NONMETALS; PNICTIDES; SILICON COMPOUNDS; SURFACE PROPERTIES; 360201* - Ceramics, Cermets, & Refractories- Preparation & Fabrication; 360204 - Ceramics, Cermets, & Refractories- Physical Properties

Citation Formats

Landingham, R L, and Casey, A W. Chemical vapor deposition of sialon. United States: N. p., Web.
Landingham, R L, & Casey, A W. Chemical vapor deposition of sialon. United States.
Landingham, R L, and Casey, A W. . "Chemical vapor deposition of sialon". United States.
@article{osti_5417810,
title = {Chemical vapor deposition of sialon},
author = {Landingham, R L and Casey, A W},
abstractNote = {A laminated composite and a method for forming the composite by chemical vapor deposition are described. The composite includes a layer of sialon and a material to which the layer is bonded. The method includes the steps of exposing a surface of the material to an ammonia containing atmosphere; heating the surface to at least about 1200/sup 0/C; and impinging a gas containing N/sub 2/, SiCl/sub 4/, and AlCl/sub 3/ on the surface.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {},
month = {}
}

Patent:
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