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Title: Improved di-p-xylylene polymer and apparatus and method for making the same

Abstract

Solid di-para-xylyene dimer is sublimed in a sublimation furnace at approximately 100 to 200/sup 0/C and subsequently conducted to a pyrolysis furnace where it is pyrolyzed to the diradical p-xylylene monomer while in the vapor state at approximately 600 degrees C. The diradical monomer is then introduced into a deposition chamber for deposition onto a suitable substrate. The deposition chamber includes electrodes for producing a low pressure plasma through which the diradical monomer passes prior to deposition. The interaction of the diradical monomer with the low pressure plasma results in the formation of poly-p-xylyene film which is exceptionally hard and thermally stable.

Inventors:
;
OSTI Identifier:
5383265
Application Number:
ON: DE84006193
Assignee:
EDB-84-036715
DOE Contract Number:  
W-7405-ENG-36
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; COATINGS; DEPOSITION; ORGANIC POLYMERS; DIMERS; MONOMERS; PYROLYSIS; CHEMICAL REACTIONS; DECOMPOSITION; ORGANIC COMPOUNDS; POLYMERS; THERMOCHEMICAL PROCESSES; 360401* - Polymers & Plastics- Preparation & Fabrication- (-1987)

Citation Formats

Jahn, R K, and Liepins, R. Improved di-p-xylylene polymer and apparatus and method for making the same. United States: N. p., Web.
Jahn, R K, & Liepins, R. Improved di-p-xylylene polymer and apparatus and method for making the same. United States.
Jahn, R K, and Liepins, R. . "Improved di-p-xylylene polymer and apparatus and method for making the same". United States.
@article{osti_5383265,
title = {Improved di-p-xylylene polymer and apparatus and method for making the same},
author = {Jahn, R K and Liepins, R},
abstractNote = {Solid di-para-xylyene dimer is sublimed in a sublimation furnace at approximately 100 to 200/sup 0/C and subsequently conducted to a pyrolysis furnace where it is pyrolyzed to the diradical p-xylylene monomer while in the vapor state at approximately 600 degrees C. The diradical monomer is then introduced into a deposition chamber for deposition onto a suitable substrate. The deposition chamber includes electrodes for producing a low pressure plasma through which the diradical monomer passes prior to deposition. The interaction of the diradical monomer with the low pressure plasma results in the formation of poly-p-xylyene film which is exceptionally hard and thermally stable.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {},
month = {}
}

Patent:
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