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Title: High energy XeBr electric discharge laser

Abstract

A high energy XeBr laser for producing coherent radiation at 282 nm is disclosed. The XeBr laser utilizes an electric discharge as the excitation source to minimize formation of molecular ions thereby minimizing absorption of laser radiation by the active medium. Additionally, HBr, is used as the halogen donor which undergoes harpooning reactions with Xe/sub M/ to form XeBr.

Inventors:
;
OSTI Identifier:
5377147
Assignee:
TIC; ERA-05-029464; EDB-80-085122
DOE Contract Number:  
W-7405-ENG-36
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; LASERS; DESIGN; HALOGENS; XENON BROMIDES; BROMIDES; BROMINE COMPOUNDS; ELEMENTS; HALIDES; HALOGEN COMPOUNDS; NONMETALS; RARE GAS COMPOUNDS; XENON COMPOUNDS; 420300* - Engineering- Lasers- (-1989)

Citation Formats

Sze, R.C., and Scott, P.B. High energy XeBr electric discharge laser. United States: N. p., Web.
Sze, R.C., & Scott, P.B. High energy XeBr electric discharge laser. United States.
Sze, R.C., and Scott, P.B. . "High energy XeBr electric discharge laser". United States.
@article{osti_5377147,
title = {High energy XeBr electric discharge laser},
author = {Sze, R.C. and Scott, P.B.},
abstractNote = {A high energy XeBr laser for producing coherent radiation at 282 nm is disclosed. The XeBr laser utilizes an electric discharge as the excitation source to minimize formation of molecular ions thereby minimizing absorption of laser radiation by the active medium. Additionally, HBr, is used as the halogen donor which undergoes harpooning reactions with Xe/sub M/ to form XeBr.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {},
month = {}
}