Thermal decomposition of silane to form hydrogenated amorphous Si
Abstract
Hydrogenated amorphous silicon is produced by thermally decomposing silane (SiH/sub 4/) or other gases comprising H and Si, at elevated temperatures of about 1700 to 2300/sup 0/C, in a vacuum of about 10/sup -8/ to 10/sup -4/ torr. A gaseous mixture is formed of atomic hydrogen and atomic silicon. The gaseous mixture is deposited onto a substrate to form hydrogenated amorphous silicon.
- Inventors:
- OSTI Identifier:
- 5374683
- Assignee:
- TIC; ERA-05-024367; EDB-80-066802
- DOE Contract Number:
- EY-76-C-02-0016
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; 14 SOLAR ENERGY; SILANES; DECOMPOSITION; SILICON; AMORPHOUS STATE; PRODUCTION; HYDROGENATION; MATERIALS; PHOTOVOLTAIC CELLS; CHEMICAL REACTIONS; DIRECT ENERGY CONVERTERS; ELEMENTS; HYDRIDES; HYDROGEN COMPOUNDS; PHOTOELECTRIC CELLS; SEMIMETALS; SILICON COMPOUNDS; 360101* - Metals & Alloys- Preparation & Fabrication; 140501 - Solar Energy Conversion- Photovoltaic Conversion
Citation Formats
Strongin, M, Ghosh, A K, Wiesmann, H J, Rock, E B, and Lutz, III, H A. Thermal decomposition of silane to form hydrogenated amorphous Si. United States: N. p.,
Web.
Strongin, M, Ghosh, A K, Wiesmann, H J, Rock, E B, & Lutz, III, H A. Thermal decomposition of silane to form hydrogenated amorphous Si. United States.
Strongin, M, Ghosh, A K, Wiesmann, H J, Rock, E B, and Lutz, III, H A. .
"Thermal decomposition of silane to form hydrogenated amorphous Si". United States.
@article{osti_5374683,
title = {Thermal decomposition of silane to form hydrogenated amorphous Si},
author = {Strongin, M and Ghosh, A K and Wiesmann, H J and Rock, E B and Lutz, III, H A},
abstractNote = {Hydrogenated amorphous silicon is produced by thermally decomposing silane (SiH/sub 4/) or other gases comprising H and Si, at elevated temperatures of about 1700 to 2300/sup 0/C, in a vacuum of about 10/sup -8/ to 10/sup -4/ torr. A gaseous mixture is formed of atomic hydrogen and atomic silicon. The gaseous mixture is deposited onto a substrate to form hydrogenated amorphous silicon.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {},
month = {}
}
Search for the full text at the U.S. Patent and Trademark Office
Note: You will be redirected to the USPTO site, which may require a pop-up blocker to be deactivated to view the patent. If so, you will need to manually turn off your browser's pop-up blocker, typically found within the browser settings. (See DOE Patents FAQs for more information.)
Save to My Library
You must Sign In or Create an Account in order to save documents to your library.