Ion source based on the cathodic arc

Sanders, D M; Falabella, S

Title: Ion source based on the cathodic arc

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Abstract

A cylindrically symmetric arc source to produce a ring of ions which leave the surface of the arc target radially and are reflected by electrostatic fields present in the source to a point of use, such as a part to be coated, is described. An array of electrically isolated rings positioned in the source serves the dual purpose of minimizing bouncing of macroparticles and providing electrical insulation to maximize the electric field gradients within the source. The source also includes a series of baffles which function as a filtering or trapping mechanism for any macroparticles. 3 figures.

Inventors:: Sanders, D M; Falabella, S

Issue Date:: 1994-02-01

OSTI Identifier:: 5239092

Patent Number(s):: 5282944

Application Number:: PPN: US 7-921779

Assignee:: Dept. of Energy, Washington, DC ()

DOE Contract Number:: W-7405-ENG-48

Resource Type:: Patent

Resource Relation:: Patent File Date: 30 Jul 1992

Country of Publication:: United States

Language:: English

Subject:: 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; Ta; ION SOURCES; DESIGN; BAFFLES; ELECTRIC FIELDS; ELECTRICAL INSULATION; CONTROL EQUIPMENT; EQUIPMENT; FLOW REGULATORS; 661220* - Particle Beam Production & Handling; Targets- (1992-)

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                    Sanders, D M, and Falabella, S. Ion source based on the cathodic arc.  United States: N. p., 1994. 
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                    Sanders, D M, & Falabella, S. Ion source based on the cathodic arc.  United States.

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                    Sanders, D M, and Falabella, S. Tue .  
        "Ion source based on the cathodic arc".  United States.

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@article{osti_5239092,

  title        = {Ion source based on the cathodic arc},

  author       = {Sanders, D M and Falabella, S},

  abstractNote = {A cylindrically symmetric arc source to produce a ring of ions which leave the surface of the arc target radially and are reflected by electrostatic fields present in the source to a point of use, such as a part to be coated, is described. An array of electrically isolated rings positioned in the source serves the dual purpose of minimizing bouncing of macroparticles and providing electrical insulation to maximize the electric field gradients within the source. The source also includes a series of baffles which function as a filtering or trapping mechanism for any macroparticles. 3 figures.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1994},

  month        = {2}

}

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