Method of making segmented pyrolytic graphite sputtering targets
Abstract
Anisotropic pyrolytic graphite wafers are oriented and bonded together such that the graphite's high thermal conductivity planes are maximized along the back surface of the segmented pyrolytic graphite target to allow for optimum heat conduction away from the sputter target's sputtering surface and to allow for maximum energy transmission from the target's sputtering surface. 2 figures.
- Inventors:
- Issue Date:
- OSTI Identifier:
- 5173597
- Patent Number(s):
- 5284539
- Application Number:
- PPN: US 8-042668
- Assignee:
- Univ. of California, Oakland, CA ()
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 5 Apr 1993
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; Ta; TARGETS; FABRICATION; ENERGY TRANSFER; GRAPHITE; PYROLYTIC CARBON; SPUTTERING; CARBON; ELEMENTAL MINERALS; ELEMENTS; MINERALS; NONMETALS; 661220* - Particle Beam Production & Handling; Targets- (1992-)
Citation Formats
McKernan, M A, Alford, C S, Makowiecki, D M, and Chen, C W. Method of making segmented pyrolytic graphite sputtering targets. United States: N. p., 1994.
Web.
McKernan, M A, Alford, C S, Makowiecki, D M, & Chen, C W. Method of making segmented pyrolytic graphite sputtering targets. United States.
McKernan, M A, Alford, C S, Makowiecki, D M, and Chen, C W. Tue .
"Method of making segmented pyrolytic graphite sputtering targets". United States.
@article{osti_5173597,
title = {Method of making segmented pyrolytic graphite sputtering targets},
author = {McKernan, M A and Alford, C S and Makowiecki, D M and Chen, C W},
abstractNote = {Anisotropic pyrolytic graphite wafers are oriented and bonded together such that the graphite's high thermal conductivity planes are maximized along the back surface of the segmented pyrolytic graphite target to allow for optimum heat conduction away from the sputter target's sputtering surface and to allow for maximum energy transmission from the target's sputtering surface. 2 figures.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1994},
month = {2}
}
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