PRODUCTION OF HAFNIUM METAL
Abstract
This patent deals with a process of producing pure Hf metal from oxygen- contaminated gaseous Hf chloride. The oxygen compounds in the chioride gas are halogenated by contacting the gas at elevated temperature with Cl/sub 2/ in the presence of C. The Hf chloride, still in gaseous form, is contacted with molten Mg whereby Hf metal is formed and condensed on the Mg. (AEC)
- Inventors:
- Issue Date:
- Research Org.:
- Originating Research Org. not identified
- OSTI Identifier:
- 4731643
- Patent Number(s):
- 3071459
- Assignee:
- U.S. Atomic Energy Commission
- Patent Classifications (CPCs):
-
C - CHEMISTRY C22 - METALLURGY C22B - PRODUCTION AND REFINING OF METALS
- NSA Number:
- NSA-17-008738
- Resource Type:
- Patent
- Resource Relation:
- Other Information: Orig. Receipt Date: 31-DEC-63
- Country of Publication:
- United States
- Language:
- English
- Subject:
- METALS, CERAMICS, AND OTHER MATERIALS; CARBON; CHLORINATION; GASES; HAFNIUM; HAFNIUM CHLORIDES; HIGH TEMPERATURE; IMPURITIES; MAGNESIUM; MELTING; OXYGEN; PATENT; PRODUCTION
Citation Formats
Elger, G W, and Boubel, R W. PRODUCTION OF HAFNIUM METAL. United States: N. p., 1963.
Web.
Elger, G W, & Boubel, R W. PRODUCTION OF HAFNIUM METAL. United States.
Elger, G W, and Boubel, R W. Tue .
"PRODUCTION OF HAFNIUM METAL". United States.
@article{osti_4731643,
title = {PRODUCTION OF HAFNIUM METAL},
author = {Elger, G W and Boubel, R W},
abstractNote = {This patent deals with a process of producing pure Hf metal from oxygen- contaminated gaseous Hf chloride. The oxygen compounds in the chioride gas are halogenated by contacting the gas at elevated temperature with Cl/sub 2/ in the presence of C. The Hf chloride, still in gaseous form, is contacted with molten Mg whereby Hf metal is formed and condensed on the Mg. (AEC)},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jan 01 00:00:00 EST 1963},
month = {Tue Jan 01 00:00:00 EST 1963}
}
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