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Title: Process for depositing Cr-bearing layer

Abstract

A method of applying a Cr-bearing layer to a substrate, comprises introducing an organometallic compound, in vapor or solid powder form entrained in a carrier gas to a plasma of an inductively coupled plasma torch or device to thermally decompose the organometallic compound and contacting the plasma and the substrate to be coated so as to deposit the Cr-bearing layer on the substrate. A metallic Cr, Cr alloy or Cr compound such as chromium oxide, nitride and carbide can be provided on the substrate. Typically, the organometallic compound is introduced to an inductively coupled plasma torch that is disposed in ambient air so to thermally decompose the organometallic compound in the plasma. The plasma is directed at the substrate to deposit the Cr-bearing layer or coating on the substrate. 7 figs.

Inventors:
; ;
Issue Date:
Research Org.:
Iowa State Univ., Ames, IA (United States)
OSTI Identifier:
46310
Patent Number(s):
5,413,821
Application Number:
PAN: 8-273,978
Assignee:
Iowa State Univ. Research Foundation, Inc., Ames, IA (United States)
DOE Contract Number:  
W-7405-ENG-82
Resource Type:
Patent
Resource Relation:
Other Information: PBD: 9 May 1995
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; CHROMIUM; PLASMA ARC SPRAYING; CHROMIUM ALLOYS; CHROMIUM OXIDES; CHROMIUM NITRIDES; CHROMIUM CARBIDES; PLASMA JETS

Citation Formats

Ellis, T W, Lograsso, T A, and Eshelman, M A. Process for depositing Cr-bearing layer. United States: N. p., 1995. Web.
Ellis, T W, Lograsso, T A, & Eshelman, M A. Process for depositing Cr-bearing layer. United States.
Ellis, T W, Lograsso, T A, and Eshelman, M A. Tue . "Process for depositing Cr-bearing layer". United States.
@article{osti_46310,
title = {Process for depositing Cr-bearing layer},
author = {Ellis, T W and Lograsso, T A and Eshelman, M A},
abstractNote = {A method of applying a Cr-bearing layer to a substrate, comprises introducing an organometallic compound, in vapor or solid powder form entrained in a carrier gas to a plasma of an inductively coupled plasma torch or device to thermally decompose the organometallic compound and contacting the plasma and the substrate to be coated so as to deposit the Cr-bearing layer on the substrate. A metallic Cr, Cr alloy or Cr compound such as chromium oxide, nitride and carbide can be provided on the substrate. Typically, the organometallic compound is introduced to an inductively coupled plasma torch that is disposed in ambient air so to thermally decompose the organometallic compound in the plasma. The plasma is directed at the substrate to deposit the Cr-bearing layer or coating on the substrate. 7 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1995},
month = {5}
}