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Title: X-ray lithography using holographic images

Methods for forming X-ray images having 0.25 {micro}m minimum line widths on X-ray sensitive material are presented. A holographic image of a desired circuit pattern is projected onto a wafer or other image-receiving substrate to allow recording of the desired image in photoresist material. In one embodiment, the method uses on-axis transmission and provides a high flux X-ray source having modest monochromaticity and coherence requirements. A layer of light-sensitive photoresist material on a wafer with a selected surface is provided to receive the image(s). The hologram has variable optical thickness and variable associated optical phase angle and amplitude attenuation for transmission of the X-rays. A second embodiment uses off-axis holography. The wafer receives the holographic image by grazing incidence reflection from a hologram printed on a flat metal or other highly reflecting surface or substrate. In this second embodiment, an X-ray beam with a high degree of monochromaticity and spatial coherence is required. 15 figs.
Inventors:
;
Issue Date:
OSTI Identifier:
458584
Assignee:
Lawrence Berkeley Lab., CA (United States) PTO; SCA: 426000; PA: EDB-97:056794; SN: 97001758985
Patent Number(s):
US 5,612,986/A/
Application Number:
PAN: 8-532,458
Contract Number:
AC03-76SF00098
Resource Relation:
Other Information: PBD: 18 Mar 1997
Research Org:
University of California
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; MICROELECTRONIC CIRCUITS; MASKING; HOLOGRAPHY; X RADIATION; IMAGES; RADIATION TRANSPORT