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Title: Flow-through ion beam source

Abstract

A method and an apparatus for forming a charge neutral ion beam which is useful in producing thin films of material on electrically conductive or non-conductive substrates are provided. 4 figs.

Inventors:
Issue Date:
Research Org.:
University of California
OSTI Identifier:
441875
Patent Number(s):
5,601,654
Application Number:
PAN: 8-657,844
Assignee:
Univ. of California, Alameda, CA (United States)
DOE Contract Number:  
W-7405-ENG-36
Resource Type:
Patent
Resource Relation:
Other Information: PBD: 11 Feb 1997
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ENERGY BEAM DEPOSITION; ION SOURCES; DESIGN; THIN FILMS; ION BEAMS

Citation Formats

Springer, R W. Flow-through ion beam source. United States: N. p., 1997. Web.
Springer, R W. Flow-through ion beam source. United States.
Springer, R W. Tue . "Flow-through ion beam source". United States.
@article{osti_441875,
title = {Flow-through ion beam source},
author = {Springer, R W},
abstractNote = {A method and an apparatus for forming a charge neutral ion beam which is useful in producing thin films of material on electrically conductive or non-conductive substrates are provided. 4 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1997},
month = {2}
}