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Title: Flow-through ion beam source

A method and an apparatus for forming a charge neutral ion beam which is useful in producing thin films of material on electrically conductive or non-conductive substrates are provided. 4 figs.
Inventors:
Issue Date:
OSTI Identifier:
441875
Assignee:
Univ. of California, Alameda, CA (United States) PTO; SCA: 360101; 360201; 360601; PA: EDB-97:041191; SN: 97001739264
Patent Number(s):
US 5,601,654/A/
Application Number:
PAN: 8-657,844
Contract Number:
W-7405-ENG-36
Resource Relation:
Other Information: PBD: 11 Feb 1997
Research Org:
University of California
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ENERGY BEAM DEPOSITION; ION SOURCES; DESIGN; THIN FILMS; ION BEAMS