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Title: GAS DISCHARGE DEVICES

Abstract

An apparatus utilized in introducing tritium gas into envelope of a gas discharge device for the purpose f maintaining the discharge path in ionized condition is described. ln addition to the cathode and anode, the ischarge device contains a zirconium or tantalum ilament arranged for external excitation and a metallic seed containing tritium, and also arranged to have a current passed through it. Initially, the zirconium or tantalum filament is vaporized to deposit its material adjacent the main discharge region. Then the tritium gas is released and, due to its affinity for the first released material, it deposits in the region of the main discharge where it is most effective in maintaining the discharge path in an ionized condition.

Inventors:
Issue Date:
Research Org.:
Originating Research Org. not identified
OSTI Identifier:
4273772
Patent Number(s):
2860269
Assignee:
U.S. Atomic Energy Commission DTIE; NSA-13-008400
NSA Number:
NSA-13-008400
Resource Type:
Patent
Resource Relation:
Other Information: Orig. Receipt Date: 31-DEC-59
Country of Publication:
United States
Language:
English
Subject:
PATENTS; ANODES; CATHODES; CURRENTS; ELECTRIC DISCHARGES; ELECTRON TUBES; EVAPORATION; EXCITATION; GASES; INSTRUMENTS; IONIZATION; METALS; PLANNING; TANTALUM; TRITIUM; WIRES; ZIRCONIUM; ZONES

Citation Formats

Jefferson, S. GAS DISCHARGE DEVICES. United States: N. p., 1958. Web.
Jefferson, S. GAS DISCHARGE DEVICES. United States.
Jefferson, S. Tue . "GAS DISCHARGE DEVICES". United States.
@article{osti_4273772,
title = {GAS DISCHARGE DEVICES},
author = {Jefferson, S.},
abstractNote = {An apparatus utilized in introducing tritium gas into envelope of a gas discharge device for the purpose f maintaining the discharge path in ionized condition is described. ln addition to the cathode and anode, the ischarge device contains a zirconium or tantalum ilament arranged for external excitation and a metallic seed containing tritium, and also arranged to have a current passed through it. Initially, the zirconium or tantalum filament is vaporized to deposit its material adjacent the main discharge region. Then the tritium gas is released and, due to its affinity for the first released material, it deposits in the region of the main discharge where it is most effective in maintaining the discharge path in an ionized condition.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1958},
month = {11}
}