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Title: Computer-aided engineering system for design of sequence arrays and lithographic masks

An improved set of computer tools for forming arrays is disclosed. According to one aspect of the invention, a computer system is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files to design and/or generate lithographic masks. 14 figs.
Inventors:
; ; ;
Issue Date:
OSTI Identifier:
426639
Assignee:
Affymetrix, Inc., Santa Clara, CA (United States) PTO; SCA: 360600; 550200; 426000; PA: EDB-97:027357; SN: 97001724498
Patent Number(s):
US 5,593,839/A/
Application Number:
PAN: 8-460,411; CNN: Contract H600813-1;Contract H600813-2
Contract Number:
FG03-92ER81275
Resource Relation:
Other Information: PBD: 14 Jan 1997
Research Org:
Affymax Research Inst
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 55 BIOLOGY AND MEDICINE, BASIC STUDIES; 42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; POLYMERS; DNA; MASKING; COMPUTER-AIDED DESIGN; COMPUTER CODES; USES