Computer-aided engineering system for design of sequence arrays and lithographic masks
An improved set of computer tools for forming arrays is disclosed. According to one aspect of the invention, a computer system is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files to design and/or generate lithographic masks. 14 figs.
- Issue Date:
- OSTI Identifier:
- 426639
- Assignee:
- Affymetrix, Inc., Santa Clara, CA (United States) PTO; SCA: 360600; 550200; 426000; PA: EDB-97:027357; SN: 97001724498
- Patent Number(s):
- US 5,593,839/A/
- Application Number:
- PAN: 8-460,411; CNN: Contract H600813-1;Contract H600813-2
- Contract Number:
- FG03-92ER81275
- Resource Relation:
- Other Information: PBD: 14 Jan 1997
- Research Org:
- Affymax Research Inst
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; 55 BIOLOGY AND MEDICINE, BASIC STUDIES; 42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; POLYMERS; DNA; MASKING; COMPUTER-AIDED DESIGN; COMPUTER CODES; USES