Computer-aided engineering system for design of sequence arrays and lithographic masks
Abstract
An improved set of computer tools for forming arrays is disclosed. According to one aspect of the invention, a computer system is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files to design and/or generate lithographic masks. 14 figs.
- Inventors:
- Issue Date:
- Research Org.:
- Affymax Research Inst
- OSTI Identifier:
- 426639
- Patent Number(s):
- 5,593,839
- Application Number:
- PAN: 8-460,411; CNN: Contract H600813-1;Contract H600813-2
- Assignee:
- Affymetrix, Inc., Santa Clara, CA (United States)
- DOE Contract Number:
- FG03-92ER81275
- Resource Type:
- Patent
- Resource Relation:
- Other Information: PBD: 14 Jan 1997
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; 55 BIOLOGY AND MEDICINE, BASIC STUDIES; 42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; POLYMERS; DNA; MASKING; COMPUTER-AIDED DESIGN; COMPUTER CODES; USES
Citation Formats
Hubbell, E A, Lipshutz, R J, Morris, M S, and Winkler, J L. Computer-aided engineering system for design of sequence arrays and lithographic masks. United States: N. p., 1997.
Web.
Hubbell, E A, Lipshutz, R J, Morris, M S, & Winkler, J L. Computer-aided engineering system for design of sequence arrays and lithographic masks. United States.
Hubbell, E A, Lipshutz, R J, Morris, M S, and Winkler, J L. Tue .
"Computer-aided engineering system for design of sequence arrays and lithographic masks". United States.
@article{osti_426639,
title = {Computer-aided engineering system for design of sequence arrays and lithographic masks},
author = {Hubbell, E A and Lipshutz, R J and Morris, M S and Winkler, J L},
abstractNote = {An improved set of computer tools for forming arrays is disclosed. According to one aspect of the invention, a computer system is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files to design and/or generate lithographic masks. 14 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1997},
month = {1}
}
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