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Title: PULSED ION SOURCE

Abstract

An improved pulsed ion source of the type where the gas to be ionized is released within the source by momentary heating of an electrode occluded with the gas is presented. The other details of the ion source construction include an electron emitting filament and a positive reference grid, between which an electron discharge is set up, and electrode means for withdrawing the ions from the source. Due to the location of the gas source behind the electrode discharge region, and the positioning of the vacuum exhaust system on the opposite side of the discharge, the released gas is drawn into the electron discharge and ionized in accurately controlled amounts. Consequently, the output pulses of the ion source may be accurately controlled.

Inventors:
Issue Date:
OSTI Identifier:
4247481
Patent Number(s):
2856532
Assignee:
U.S. Atomic Energy Commission
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
NSA Number:
NSA-13-008370
Resource Type:
Patent
Resource Relation:
Other Information: Orig. Receipt Date: 31-DEC-59
Country of Publication:
United States
Language:
English
Subject:
PATENTS; CONTROL; ELECTRIC DISCHARGES; ELECTRODES; ELECTRONS; EMISSION; GAS FLOW; GASES; GRIDS; HEATING; ION SOURCES; IONIZATION; IONS; PULSES; THERMIONICS; VACUUM; WIRES

Citation Formats

Martina, E F. PULSED ION SOURCE. United States: N. p., 1958. Web.
Martina, E F. PULSED ION SOURCE. United States.
Martina, E F. Tue . "PULSED ION SOURCE". United States.
@article{osti_4247481,
title = {PULSED ION SOURCE},
author = {Martina, E F},
abstractNote = {An improved pulsed ion source of the type where the gas to be ionized is released within the source by momentary heating of an electrode occluded with the gas is presented. The other details of the ion source construction include an electron emitting filament and a positive reference grid, between which an electron discharge is set up, and electrode means for withdrawing the ions from the source. Due to the location of the gas source behind the electrode discharge region, and the positioning of the vacuum exhaust system on the opposite side of the discharge, the released gas is drawn into the electron discharge and ionized in accurately controlled amounts. Consequently, the output pulses of the ion source may be accurately controlled.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1958},
month = {10}
}