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Title: Ion producing mechanism

Abstract

This patent pertains to calutrons and more particularly to means for introducing gas at selected points in the arc chamber of a calutron source to remedy unsteadiness in the arc. The disclosed ion source has a baffle at the gas entrance in the arc chamber for directing part of the gas flow toward the anode end of the chamber. The resulting arc is much steadier, resulting in an ion beam of increased current.

Inventors:
Issue Date:
Research Org.:
Originating Research Org. not identified
OSTI Identifier:
4229530
Patent Number(s):
2882411
Assignee:
U.S. Atomic Energy Commission
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
NSA Number:
NSA-13-022588
Resource Type:
Patent
Resource Relation:
Other Information: Orig. Receipt Date: 31-DEC-59
Country of Publication:
United States
Language:
English
Subject:
PARTICLE ACCELERATORS AND HIGH-VOLTAGE MACHINES; ANODES; CALUTRON; CONTROL; CURRENTS; ELECTRIC ARCS; GAS FLOW; GASES; ION BEAMS; ION SOURCES; IONS; ISOTOPE SEPARATION; MASS SPECTROMETERS; PRODUCTION; STABILITY; VESSELS

Citation Formats

Oppenheimer, F. F.. Ion producing mechanism. United States: N. p., 1959. Web.
Oppenheimer, F. F.. Ion producing mechanism. United States.
Oppenheimer, F. F.. Tue . "Ion producing mechanism". United States. https://www.osti.gov/servlets/purl/4229530.
@article{osti_4229530,
title = {Ion producing mechanism},
author = {Oppenheimer, F. F.},
abstractNote = {This patent pertains to calutrons and more particularly to means for introducing gas at selected points in the arc chamber of a calutron source to remedy unsteadiness in the arc. The disclosed ion source has a baffle at the gas entrance in the arc chamber for directing part of the gas flow toward the anode end of the chamber. The resulting arc is much steadier, resulting in an ion beam of increased current.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1959},
month = {4}
}