Electron beam device
Abstract
This patent pertains to an electron beam device in which a hollow target is symmetrically irradiated by a high energy, pulsed electron beam about its periphery and wherein the outer portion of the target has a thickness slightly greater than required to absorb the electron beam pulse energy. (auth)
- Inventors:
- Issue Date:
- Research Org.:
- Originating Research Org. not identified
- OSTI Identifier:
- 4134821
- Patent Number(s):
- 3899681
- Assignee:
- to U.S. Energy Research and Development Administration
- Patent Classifications (CPCs):
-
H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05H - PLASMA TECHNIQUE
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE Y02E - REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- NSA Number:
- NSA-33-009091
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 1974 Apr 01; Other Information: G21b1/00. Orig. Receipt Date: 30-JUN-76
- Country of Publication:
- United States
- Language:
- English
- Subject:
- N70800* -Physics-Controlled Thermonuclear Research- Thermonuclear Engineering & Equipment; 700205* -Fusion Energy-Fusion Power Plant Technology- Heating & Fueling Systems; *ELECTRON SOURCES- SPECIFICATIONS; *THERMONUCLEAR DEVICES- ELECTRON SOURCES; BEAM-PLASMA SYSTEMS; ELECTRON BEAMS; IRRADIATION; TARGETS
Citation Formats
Beckner, E H, and Clauser, M J. Electron beam device. United States: N. p., 1975.
Web.
Beckner, E H, & Clauser, M J. Electron beam device. United States.
Beckner, E H, and Clauser, M J. Tue .
"Electron beam device". United States.
@article{osti_4134821,
title = {Electron beam device},
author = {Beckner, E H and Clauser, M J},
abstractNote = {This patent pertains to an electron beam device in which a hollow target is symmetrically irradiated by a high energy, pulsed electron beam about its periphery and wherein the outer portion of the target has a thickness slightly greater than required to absorb the electron beam pulse energy. (auth)},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1975},
month = {8}
}
Search for the full text at the U.S. Patent and Trademark Office
Note: You will be redirected to the USPTO site, which may require a pop-up blocker to be deactivated to view the patent. If so, you will need to manually turn off your browser's pop-up blocker, typically found within the browser settings. (See DOE Patents FAQs for more information.)