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Title: ION PUMP

Abstract

An ion pump and pumping method are given for low vacuum pressures in which gases introduced into a pumping cavity are ionized and thereafter directed and accelerated into a quantity of liquid gettering metal where they are absorbed. In the preferred embodiment the metal is disposed as a liquid pool upon one electrode of a Phillips ion gauge type pump. Means are provided for continuously and remotely withdrawing and degassing the gettering metal. The liquid gettering metal may be heated if desired, although various combinations of gallium, indium, tin, bismuth, and lead, the preferred metals, have very low melting points. A background pressure of evaporated gettering metal may be provided by means of a resistance heated refractory metal wick protruding from the surface of the pcol of gettering metal.

Inventors:
Issue Date:
Research Org.:
Originating Research Org. not identified
OSTI Identifier:
4112968
Patent Number(s):
2967257
Assignee:
U.S. Atomic Energy Commission DTIE; NSA-15-007489
NSA Number:
NSA-15-007489
Resource Type:
Patent
Resource Relation:
Other Information: Orig. Receipt Date: 31-DEC-61
Country of Publication:
United States
Language:
English
Subject:
ENGINEERING AND EQUIPMENT; ABSORPTION; BACKGROUND; BISMUTH; DEGASSING; ELECTRODES; EVAPORATION; GALLIUM; GASES; GETTER; INDIUM; ION PUMPS; IONIZATION; LEAD; LIQUID METALS; METALS; PRESSURE; PUMPS; REFRACTORIES; REFRACTORY MATERIALS; TIN; VACUUM

Citation Formats

Milleron, N. ION PUMP. United States: N. p., 1961. Web.
Milleron, N. ION PUMP. United States.
Milleron, N. Sun . "ION PUMP". United States.
@article{osti_4112968,
title = {ION PUMP},
author = {Milleron, N.},
abstractNote = {An ion pump and pumping method are given for low vacuum pressures in which gases introduced into a pumping cavity are ionized and thereafter directed and accelerated into a quantity of liquid gettering metal where they are absorbed. In the preferred embodiment the metal is disposed as a liquid pool upon one electrode of a Phillips ion gauge type pump. Means are provided for continuously and remotely withdrawing and degassing the gettering metal. The liquid gettering metal may be heated if desired, although various combinations of gallium, indium, tin, bismuth, and lead, the preferred metals, have very low melting points. A background pressure of evaporated gettering metal may be provided by means of a resistance heated refractory metal wick protruding from the surface of the pcol of gettering metal.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1961},
month = {1}
}