ION PUMP
Abstract
An ion pump and pumping method are given for low vacuum pressures in which gases introduced into a pumping cavity are ionized and thereafter directed and accelerated into a quantity of liquid gettering metal where they are absorbed. In the preferred embodiment the metal is disposed as a liquid pool upon one electrode of a Phillips ion gauge type pump. Means are provided for continuously and remotely withdrawing and degassing the gettering metal. The liquid gettering metal may be heated if desired, although various combinations of gallium, indium, tin, bismuth, and lead, the preferred metals, have very low melting points. A background pressure of evaporated gettering metal may be provided by means of a resistance heated refractory metal wick protruding from the surface of the pcol of gettering metal.
- Inventors:
- Issue Date:
- Research Org.:
- Originating Research Org. not identified
- OSTI Identifier:
- 4112968
- Patent Number(s):
- 2967257
- Assignee:
- U.S. Atomic Energy Commission DTIE; NSA-15-007489
- NSA Number:
- NSA-15-007489
- Resource Type:
- Patent
- Resource Relation:
- Other Information: Orig. Receipt Date: 31-DEC-61
- Country of Publication:
- United States
- Language:
- English
- Subject:
- ENGINEERING AND EQUIPMENT; ABSORPTION; BACKGROUND; BISMUTH; DEGASSING; ELECTRODES; EVAPORATION; GALLIUM; GASES; GETTER; INDIUM; ION PUMPS; IONIZATION; LEAD; LIQUID METALS; METALS; PRESSURE; PUMPS; REFRACTORIES; REFRACTORY MATERIALS; TIN; VACUUM
Citation Formats
Milleron, N. ION PUMP. United States: N. p., 1961.
Web.
Milleron, N. ION PUMP. United States.
Milleron, N. Sun .
"ION PUMP". United States.
@article{osti_4112968,
title = {ION PUMP},
author = {Milleron, N.},
abstractNote = {An ion pump and pumping method are given for low vacuum pressures in which gases introduced into a pumping cavity are ionized and thereafter directed and accelerated into a quantity of liquid gettering metal where they are absorbed. In the preferred embodiment the metal is disposed as a liquid pool upon one electrode of a Phillips ion gauge type pump. Means are provided for continuously and remotely withdrawing and degassing the gettering metal. The liquid gettering metal may be heated if desired, although various combinations of gallium, indium, tin, bismuth, and lead, the preferred metals, have very low melting points. A background pressure of evaporated gettering metal may be provided by means of a resistance heated refractory metal wick protruding from the surface of the pcol of gettering metal.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1961},
month = {1}
}