URANIUM ETCHANT AND METHOD.
- Inventors:
- Issue Date:
- Research Org.:
- Originating Research Org. not identified
- OSTI Identifier:
- 4064188
- Patent Number(s):
- 3573120
- Assignee:
- (to United States Atomic Energy Commission).
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23F - NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE
- NSA Number:
- NSA-25-029798
- Resource Type:
- Patent
- Resource Relation:
- Other Information: Orig. Receipt Date: 31-DEC-71
- Country of Publication:
- United States
- Language:
- English
- Subject:
- N30120* -Metals, Ceramics, & Other Materials-Metals & Alloys-Preparation & Fabrication; ETCHING; IRON CHLORIDES; NICKEL CHLORIDES; PATENT; PERFORMANCE; SOLUTIONS; URANIUM; WATER; NICKEL CHLORIDES/properties of aqueous, for etching uranium and uranium alloys; URANIUM ALLOYS AND SYSTEMS/etching of, properties of aqueous ferric chloride and nickel chloride for; URANIUM/etching of, properties of aqueous ferric chloride and nickel chloride for; IRON CHLORIDES FeCl$sub 3$/ properties of aqueous, for etching uranium and uranium alloys
Citation Formats
Waldrop, F B, and Bezik, M J. URANIUM ETCHANT AND METHOD.. United States: N. p., 1971.
Web.
Waldrop, F B, & Bezik, M J. URANIUM ETCHANT AND METHOD.. United States.
Waldrop, F B, and Bezik, M J. Fri .
"URANIUM ETCHANT AND METHOD.". United States.
@article{osti_4064188,
title = {URANIUM ETCHANT AND METHOD.},
author = {Waldrop, F B and Bezik, M J},
abstractNote = {},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1971},
month = {1}
}
Search for the full text at the U.S. Patent and Trademark Office
Note: You will be redirected to the USPTO site, which may require a pop-up blocker to be deactivated to view the patent. If so, you will need to manually turn off your browser's pop-up blocker, typically found within the browser settings. (See DOE Patents FAQs for more information.)
Save to My Library
You must Sign In or Create an Account in order to save documents to your library.