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Title: Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources

Method and apparatus for producing extreme ultraviolet (EUV) and soft x-ray radiation from an ultra-low debris plasma source are disclosed. Targets are produced by the free jet expansion of various gases through a temperature controlled nozzle to form molecular clusters. These target clusters are subsequently irradiated with commercially available lasers of moderate intensity (10{sup 11}--10{sup 12} watts/cm{sup 2}) to produce a plasma radiating in the region of 0.5 to 100 nanometers. By appropriate adjustment of the experimental conditions the laser focus can be moved 10--30 mm from the nozzle thereby eliminating debris produced by plasma erosion of the nozzle. 5 figs.
Inventors:
;
Issue Date:
OSTI Identifier:
403666
Assignee:
SNL; SCA: 070201; PA: EDB-97:001291; SN: 96001695586
Patent Number(s):
US 5,577,092/A/
Application Number:
PAN: 8-378,426; TRN: 97:000141
Contract Number:
AC04-94AL85000
Resource Relation:
Other Information: PBD: 19 Nov 1996
Research Org:
Sandia Corporation
Country of Publication:
United States
Language:
English
Subject:
07 ISOTOPE AND RADIATION SOURCE TECHNOLOGY; LASER-PRODUCED PLASMA; EXTREME ULTRAVIOLET RADIATION; SOFT X RADIATION; RADIATION SOURCES; LASER TARGETS; DESIGN; PLASMA PRODUCTION; CLUSTER BEAMS

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