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Title: Optical processing furnace with quartz muffle and diffuser plate

An optical furnace for annealing a process wafer is disclosed comprising a source of optical energy, a quartz muffle having a door to hold the wafer for processing, and a quartz diffuser plate to diffuse the light impinging on the quartz muffle; a feedback system with a light sensor located in the wall of the muffle is also provided for controlling the source of optical energy. 5 figs.
Inventors:
Issue Date:
OSTI Identifier:
403665
Assignee:
Midwest Research Inst., Kansas City, MO (United States) CHO; SCA: 360601; PA: EDB-97:003423; SN: 96001695585
Patent Number(s):
US 5,577,157/A/
Application Number:
PAN: 8-462,752
Contract Number:
AC02-83CH10093
Resource Relation:
Other Information: PBD: 19 Nov 1996
Research Org:
Midwest Research Institute; National Renewable Energy Lab. (NREL), Golden, CO (United States)
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; SEMICONDUCTOR MATERIALS; ANNEALING; FURNACES; DESIGN; MATERIALS HANDLING EQUIPMENT; VISIBLE RADIATION; MONITORS; CONTROL EQUIPMENT; LIGHT SOURCES

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