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Title: High energy chemical laser system

Abstract

A high energy chemical laser system is described wherein explosive gaseous mixtures of a reducing agent providing hydrogen isotopes and interhalogen compounds are uniformly ignited by means of an electrical discharge, flash- photolysis or an electron beam. The resulting chemical explosion pumps a lasing chemical species, hydrogen fluoride or deuterium fluoride which is formed in the chemical reaction. The generated lasing pulse has light frequencies in the 3- micron range. Suitable interhalogen compounds include bromine trifluoride (BrF$sub 3$), bromine pentafluoride (BrF$sub 5$), chlorine monofluoride (ClF), chlorine trifluoride (ClF$sub 3$), chlorine pentafluoride (ClF$sub 5$), iodine pentafluoride (IF$sub 5$), and iodine heptafluoride (IF$sub 7$); and suitable reducing agents include hydrogen (H$sub 2$), hydrocarbons such as methane (CH$sub 4$), deuterium (D$sub 2$), and diborane (B$sub 2$H$sub 6$), as well as combinations of the gaseous compound and/or molecular mixtures of the reducing agent.

Inventors:
;
Issue Date:
OSTI Identifier:
4022059
Patent Number(s):
3928821
Assignee:
to U.S. Energy Research and Development Administration
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01S - DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT
NSA Number:
NSA-33-025803
Resource Type:
Patent
Resource Relation:
Patent File Date: 1975 Jan 23; Other Information: H01S3/22. Orig. Receipt Date: 30-JUN-76
Country of Publication:
United States
Language:
English
Subject:
N42210* -Engineering-Facilities & Equipment-Lasers; 420300* -Engineering-Lasers; *CHEMICAL LASERS- DESIGN; DEUTERIUM COMPOUNDS; HYDROFLUORIC ACID

Citation Formats

Gregg, D W, and Pearson, R K. High energy chemical laser system. United States: N. p., 1975. Web.
Gregg, D W, & Pearson, R K. High energy chemical laser system. United States.
Gregg, D W, and Pearson, R K. Tue . "High energy chemical laser system". United States.
@article{osti_4022059,
title = {High energy chemical laser system},
author = {Gregg, D W and Pearson, R K},
abstractNote = {A high energy chemical laser system is described wherein explosive gaseous mixtures of a reducing agent providing hydrogen isotopes and interhalogen compounds are uniformly ignited by means of an electrical discharge, flash- photolysis or an electron beam. The resulting chemical explosion pumps a lasing chemical species, hydrogen fluoride or deuterium fluoride which is formed in the chemical reaction. The generated lasing pulse has light frequencies in the 3- micron range. Suitable interhalogen compounds include bromine trifluoride (BrF$sub 3$), bromine pentafluoride (BrF$sub 5$), chlorine monofluoride (ClF), chlorine trifluoride (ClF$sub 3$), chlorine pentafluoride (ClF$sub 5$), iodine pentafluoride (IF$sub 5$), and iodine heptafluoride (IF$sub 7$); and suitable reducing agents include hydrogen (H$sub 2$), hydrocarbons such as methane (CH$sub 4$), deuterium (D$sub 2$), and diborane (B$sub 2$H$sub 6$), as well as combinations of the gaseous compound and/or molecular mixtures of the reducing agent.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1975},
month = {12}
}