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Title: Multi-gap high impedance plasma opening switch

Abstract

A high impedance plasma opening switch having an anode and a cathode and at least one additional electrode placed between the anode and cathode is disclosed. The presence of the additional electrodes leads to the creation of additional plasma gaps which are in series, increasing the net impedance of the switch. An equivalent effect can be obtained by using two or more conventional plasma switches with their plasma gaps wired in series. Higher impedance switches can provide high current and voltage to higher impedance loads such as plasma radiation sources. 12 figs.

Inventors:
Issue Date:
Research Org.:
University of California
OSTI Identifier:
392657
Patent Number(s):
5,568,019
Application Number:
PAN: 8-349,337
Assignee:
Univ. of California, Oakland, CA (United States)
DOE Contract Number:  
W-7405-ENG-36
Resource Type:
Patent
Resource Relation:
Other Information: PBD: 22 Oct 1996
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; PLASMA SWITCHES; DESIGN; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; USES

Citation Formats

Mason, R J. Multi-gap high impedance plasma opening switch. United States: N. p., 1996. Web.
Mason, R J. Multi-gap high impedance plasma opening switch. United States.
Mason, R J. Tue . "Multi-gap high impedance plasma opening switch". United States.
@article{osti_392657,
title = {Multi-gap high impedance plasma opening switch},
author = {Mason, R J},
abstractNote = {A high impedance plasma opening switch having an anode and a cathode and at least one additional electrode placed between the anode and cathode is disclosed. The presence of the additional electrodes leads to the creation of additional plasma gaps which are in series, increasing the net impedance of the switch. An equivalent effect can be obtained by using two or more conventional plasma switches with their plasma gaps wired in series. Higher impedance switches can provide high current and voltage to higher impedance loads such as plasma radiation sources. 12 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1996},
month = {10}
}