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Title: Computer-aided engineering system for design of sequence arrays and lithographic masks

An improved set of computer tools for forming arrays is disclosed. According to one aspect of the invention, a computer system is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files to design and/or generate lithographic masks. 14 figs.
Inventors:
; ;
Issue Date:
OSTI Identifier:
392648
Assignee:
Affymax Technologies N.V., Curaco (Netherlands Antilles) PTO; SCA: 990200; 550200; 360600; 426000; PA: EDB-96:169261; SN: 96001682408
Patent Number(s):
US 5,571,639/A/
Application Number:
PAN: 8-249,188; CNN: Contract H600813-1;Contract H600813-2
Contract Number:
FG03-92ER81275
Resource Relation:
Other Information: PBD: 5 Nov 1996
Research Org:
Affymax Research Inst
Country of Publication:
United States
Language:
English
Subject:
99 MATHEMATICS, COMPUTERS, INFORMATION SCIENCE, MANAGEMENT, LAW, MISCELLANEOUS; 55 BIOLOGY AND MEDICINE, BASIC STUDIES; 36 MATERIALS SCIENCE; 42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; COMPUTER-AIDED DESIGN; DNA; INTEGRATED CIRCUITS; MASKING; POLYMERS; FABRICATION