Computer-aided engineering system for design of sequence arrays and lithographic masks
Abstract
An improved set of computer tools for forming arrays is disclosed. According to one aspect of the invention, a computer system is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files to design and/or generate lithographic masks. 14 figs.
- Inventors:
- Issue Date:
- Research Org.:
- Affymax Research Inst
- OSTI Identifier:
- 392648
- Patent Number(s):
- 5571639
- Application Number:
- PAN: 8-249,188; CNN: Contract H600813-1;Contract H600813-2
- Assignee:
- Affymax Technologies N.V., Curaco (Netherlands Antilles)
- DOE Contract Number:
- FG03-92ER81275
- Resource Type:
- Patent
- Resource Relation:
- Other Information: PBD: 5 Nov 1996
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 99 MATHEMATICS, COMPUTERS, INFORMATION SCIENCE, MANAGEMENT, LAW, MISCELLANEOUS; 55 BIOLOGY AND MEDICINE, BASIC STUDIES; 36 MATERIALS SCIENCE; 42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; COMPUTER-AIDED DESIGN; DNA; INTEGRATED CIRCUITS; MASKING; POLYMERS; FABRICATION
Citation Formats
Hubbell, E A, Morris, M S, and Winkler, J L. Computer-aided engineering system for design of sequence arrays and lithographic masks. United States: N. p., 1996.
Web.
Hubbell, E A, Morris, M S, & Winkler, J L. Computer-aided engineering system for design of sequence arrays and lithographic masks. United States.
Hubbell, E A, Morris, M S, and Winkler, J L. Tue .
"Computer-aided engineering system for design of sequence arrays and lithographic masks". United States.
@article{osti_392648,
title = {Computer-aided engineering system for design of sequence arrays and lithographic masks},
author = {Hubbell, E A and Morris, M S and Winkler, J L},
abstractNote = {An improved set of computer tools for forming arrays is disclosed. According to one aspect of the invention, a computer system is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files to design and/or generate lithographic masks. 14 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Nov 05 00:00:00 EST 1996},
month = {Tue Nov 05 00:00:00 EST 1996}
}
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