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Title: Propenyl ether monomers for photopolymerization

Propenyl ether monomers of formula A(OCH{double_bond}CHCH{sub 3}){sub n} wherein n is an integer from one to six and A is selected from cyclic ethers, polyether and alkanes are disclosed. The monomers are readily polymerized in the presence of cationic photoinitiators, when exposed to actinic radiation, to form poly(propenyl ethers) that are useful for coatings, sealants, varnishes and adhesives. Compositions for preparing polymeric coatings comprising the compounds of the above formula together with particular cationic photoinitiators are also disclosed, as are processes for making the monomers from allyl halides and readily available alcohols. The process involves rearranging the resulting allyl ethers to propenyl ethers.
Inventors:
Issue Date:
OSTI Identifier:
392639
Assignee:
Rensselaer Polytechnic Inst., Troy, NY (United States) PTO; SCA: 360601; 400500; PA: EDB-96:166257; SN: 96001682427
Patent Number(s):
US 5,567,858/A/
Application Number:
PAN: 8-571,200
Contract Number:
FG02-91ER12117
Resource Relation:
Other Information: PBD: 22 Oct 1996
Research Org:
Rensselaer Polytechnic Inst
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 40 CHEMISTRY; POLYETHYLENE GLYCOLS; POLYMERIZATION; ALKANES; ETHERS; COATINGS; SYNTHESIS; SEALING MATERIALS; ADHESIVES; PHOTOCHEMICAL REACTIONS; MOLECULAR STRUCTURE