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Title: Virtual mask digital electron beam lithography

Abstract

Systems and methods for direct-to-digital holography are described. An apparatus includes a laser; a beamsplitter optically coupled to the laser; a reference beam mirror optically coupled to the beamsplitter; an object optically coupled to the beamsplitter, a focusing lens optically coupled to both the reference beam mirror and the object; and a digital recorder optically coupled to the focusing lens. A reference beam is incident upon the reference beam mirror at a non-normal angle, and the reference beam and an object beam are focused by the focusing lens at a focal plane of the digital recorder to form an image. The systems and methods provide advantages in that computer assisted holographic measurements can be made. 5 figs.

Inventors:
; ; ; ; ;
Issue Date:
Research Org.:
Lockheed Martin Energy Research Corporation
Sponsoring Org.:
USDOE, Washington, DC (United States)
OSTI Identifier:
335477
Patent Number(s):
5,892,231
Application Number:
PAN: 8-795,003
Assignee:
Lockheed Martin Energy Research Corp., Oak Ridge, TN (United States) PTO; SCA: 426000; PA: EDB-99:046793; SN: 99002077296
DOE Contract Number:  
AC05-96OR22464
Resource Type:
Patent
Resource Relation:
Other Information: PBD: 6 Apr 1999
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; DESIGN; HOLOGRAPHY; LASER RADIATION; BEAM OPTICS; RECORDING SYSTEMS; DIGITAL SYSTEMS; ELECTRON BEAMS; MASKING; ELECTRONIC CIRCUITS

Citation Formats

Baylor, L.R., Thomas, C.E., Voelkl, E., Moore, J.A., Simpson, M.L., and Paulus, M.J. Virtual mask digital electron beam lithography. United States: N. p., 1999. Web.
Baylor, L.R., Thomas, C.E., Voelkl, E., Moore, J.A., Simpson, M.L., & Paulus, M.J. Virtual mask digital electron beam lithography. United States.
Baylor, L.R., Thomas, C.E., Voelkl, E., Moore, J.A., Simpson, M.L., and Paulus, M.J. Tue . "Virtual mask digital electron beam lithography". United States.
@article{osti_335477,
title = {Virtual mask digital electron beam lithography},
author = {Baylor, L.R. and Thomas, C.E. and Voelkl, E. and Moore, J.A. and Simpson, M.L. and Paulus, M.J.},
abstractNote = {Systems and methods for direct-to-digital holography are described. An apparatus includes a laser; a beamsplitter optically coupled to the laser; a reference beam mirror optically coupled to the beamsplitter; an object optically coupled to the beamsplitter, a focusing lens optically coupled to both the reference beam mirror and the object; and a digital recorder optically coupled to the focusing lens. A reference beam is incident upon the reference beam mirror at a non-normal angle, and the reference beam and an object beam are focused by the focusing lens at a focal plane of the digital recorder to form an image. The systems and methods provide advantages in that computer assisted holographic measurements can be made. 5 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1999},
month = {4}
}