Virtual mask digital electron beam lithography
Abstract
Systems and methods for direct-to-digital holography are described. An apparatus includes a laser; a beamsplitter optically coupled to the laser; a reference beam mirror optically coupled to the beamsplitter; an object optically coupled to the beamsplitter, a focusing lens optically coupled to both the reference beam mirror and the object; and a digital recorder optically coupled to the focusing lens. A reference beam is incident upon the reference beam mirror at a non-normal angle, and the reference beam and an object beam are focused by the focusing lens at a focal plane of the digital recorder to form an image. The systems and methods provide advantages in that computer assisted holographic measurements can be made. 5 figs.
- Inventors:
- Issue Date:
- Research Org.:
- Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
- Sponsoring Org.:
- USDOE, Washington, DC (United States)
- OSTI Identifier:
- 335477
- Patent Number(s):
- 5892231
- Application Number:
- PAN: 8-795,003
- Assignee:
- Lockheed Martin Energy Research Corp., Oak Ridge, TN (United States)
- DOE Contract Number:
- AC05-96OR22464
- Resource Type:
- Patent
- Resource Relation:
- Other Information: PBD: 6 Apr 1999
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; DESIGN; HOLOGRAPHY; LASER RADIATION; BEAM OPTICS; RECORDING SYSTEMS; DIGITAL SYSTEMS; ELECTRON BEAMS; MASKING; ELECTRONIC CIRCUITS
Citation Formats
Baylor, L R, Thomas, C E, Voelkl, E, Moore, J A, Simpson, M L, and Paulus, M J. Virtual mask digital electron beam lithography. United States: N. p., 1999.
Web.
Baylor, L R, Thomas, C E, Voelkl, E, Moore, J A, Simpson, M L, & Paulus, M J. Virtual mask digital electron beam lithography. United States.
Baylor, L R, Thomas, C E, Voelkl, E, Moore, J A, Simpson, M L, and Paulus, M J. Tue .
"Virtual mask digital electron beam lithography". United States.
@article{osti_335477,
title = {Virtual mask digital electron beam lithography},
author = {Baylor, L R and Thomas, C E and Voelkl, E and Moore, J A and Simpson, M L and Paulus, M J},
abstractNote = {Systems and methods for direct-to-digital holography are described. An apparatus includes a laser; a beamsplitter optically coupled to the laser; a reference beam mirror optically coupled to the beamsplitter; an object optically coupled to the beamsplitter, a focusing lens optically coupled to both the reference beam mirror and the object; and a digital recorder optically coupled to the focusing lens. A reference beam is incident upon the reference beam mirror at a non-normal angle, and the reference beam and an object beam are focused by the focusing lens at a focal plane of the digital recorder to form an image. The systems and methods provide advantages in that computer assisted holographic measurements can be made. 5 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1999},
month = {4}
}
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