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Title: Process to form mesostructured films

Abstract

This invention comprises a method to form a family of supported films with pore size in the approximate range 0.8-20 nm exhibiting highly ordered microstructures and porosity derived from an ordered micellar or liquid-crystalline organic-inorganic precursor structure that forms during film deposition. Optically transparent, 100-500-nm thick films exhibiting a unique range of microstructures and uni-modal pore sizes are formed in seconds in a continuous coating operation. Applications of these films include sensors, membranes, low dielectric constant interlayers, anti-reflective coatings, and optical hosts. 12 figs.

Inventors:
; ; ;
Issue Date:
Research Org.:
Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
Sponsoring Org.:
USDOE, Washington, DC (United States)
OSTI Identifier:
321307
Patent Number(s):
5858457
Application Number:
PAN: 8-937,407
Assignee:
Sandia Corp., Albuquerque, NM (United States)
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Resource Relation:
Other Information: PBD: 12 Jan 1999
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; FABRICATION; FILMS; USES; MEMBRANES; DIELECTRIC MATERIALS; ANTIREFLECTION COATINGS; MICROSTRUCTURE; POROSITY; LIQUID CRYSTALS; PRECURSOR; MICELLAR SYSTEMS

Citation Formats

Brinker, C J, Anderson, M T, Ganguli, R, and Lu, Y F. Process to form mesostructured films. United States: N. p., 1999. Web.
Brinker, C J, Anderson, M T, Ganguli, R, & Lu, Y F. Process to form mesostructured films. United States.
Brinker, C J, Anderson, M T, Ganguli, R, and Lu, Y F. Tue . "Process to form mesostructured films". United States.
@article{osti_321307,
title = {Process to form mesostructured films},
author = {Brinker, C J and Anderson, M T and Ganguli, R and Lu, Y F},
abstractNote = {This invention comprises a method to form a family of supported films with pore size in the approximate range 0.8-20 nm exhibiting highly ordered microstructures and porosity derived from an ordered micellar or liquid-crystalline organic-inorganic precursor structure that forms during film deposition. Optically transparent, 100-500-nm thick films exhibiting a unique range of microstructures and uni-modal pore sizes are formed in seconds in a continuous coating operation. Applications of these films include sensors, membranes, low dielectric constant interlayers, anti-reflective coatings, and optical hosts. 12 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1999},
month = {1}
}