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Title: Maskless lithography

Abstract

The present invention provides a method for maskless lithography. A plurality of individually addressable and rotatable micromirrors together comprise a two-dimensional array of micromirrors. Each micromirror in the two-dimensional array can be envisioned as an individually addressable element in the picture that comprises the circuit pattern desired. As each micromirror is addressed it rotates so as to reflect light from a light source onto a portion of the photoresist coated wafer thereby forming a pixel within the circuit pattern. By electronically addressing a two-dimensional array of these micromirrors in the proper sequence a circuit pattern that is comprised of these individual pixels can be constructed on a microchip. The reflecting surface of the micromirror is configured in such a way as to overcome coherence and diffraction effects in order to produce circuit elements having straight sides. 12 figs.

Inventors:
;
Issue Date:
Research Org.:
Sandia Corporation
Sponsoring Org.:
USDOE, Washington, DC (United States)
OSTI Identifier:
321291
Patent Number(s):
5,870,176
Application Number:
PAN: 8-878,444
Assignee:
Sandia Corp., Livermore, CA (United States) SNL; SCA: 426000; PA: EDB-99:031232; SN: 99002064390
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Resource Relation:
Other Information: PBD: 9 Feb 1999
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; MICROELECTRONIC CIRCUITS; FABRICATION; MASKING; OPTICAL SYSTEMS; DESIGN; SCREEN PRINTING

Citation Formats

Sweatt, W.C., and Stulen, R.H. Maskless lithography. United States: N. p., 1999. Web.
Sweatt, W.C., & Stulen, R.H. Maskless lithography. United States.
Sweatt, W.C., and Stulen, R.H. Tue . "Maskless lithography". United States.
@article{osti_321291,
title = {Maskless lithography},
author = {Sweatt, W.C. and Stulen, R.H.},
abstractNote = {The present invention provides a method for maskless lithography. A plurality of individually addressable and rotatable micromirrors together comprise a two-dimensional array of micromirrors. Each micromirror in the two-dimensional array can be envisioned as an individually addressable element in the picture that comprises the circuit pattern desired. As each micromirror is addressed it rotates so as to reflect light from a light source onto a portion of the photoresist coated wafer thereby forming a pixel within the circuit pattern. By electronically addressing a two-dimensional array of these micromirrors in the proper sequence a circuit pattern that is comprised of these individual pixels can be constructed on a microchip. The reflecting surface of the micromirror is configured in such a way as to overcome coherence and diffraction effects in order to produce circuit elements having straight sides. 12 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1999},
month = {2}
}