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Title: Magnetic filter apparatus and method for generating cold plasma in semiconductor processing

Disclosed herein is a system and method for providing a plasma flood having a low electron temperature to a semiconductor target region during an ion implantation process. The plasma generator providing the plasma is coupled to a magnetic filter which allows ions and low energy electrons to pass therethrough while retaining captive the primary or high energy electrons. The ions and low energy electrons form a ``cold plasma`` which is diffused in the region of the process surface while the ion implantation process takes place. 15 figs.
Inventors:
Issue Date:
OSTI Identifier:
288028
Assignee:
Electro-Graph, Inc., Carlsbad, CA (United States) PTO; SCA: 360601; PA: EDB-96:135963; SN: 96001636037
Patent Number(s):
US 5,545,257/A/
Application Number:
PAN: 8-258,958
Contract Number:
AC03-76SF00098
Resource Relation:
Other Information: PBD: 13 Aug 1996
Research Org:
University of California
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; COLD PLASMA; PLASMA PRODUCTION; SEMICONDUCTOR MATERIALS; ION IMPLANTATION; PROCESSING