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Title: Magnetron sputtered boron films and Ti/B multilayer structures

A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for ultra-thin band pass filters as well as the low Z element in low Z/high Z mirrors which enhance reflectivity from grazing to normal incidence. 6 figs.
Inventors:
;
Issue Date:
OSTI Identifier:
27730
Assignee:
Univ. of California, Oakland, CA (United States) PTO; SCA: 360601; PA: EDB-95:058073; SN: 95001354475
Patent Number(s):
US 5,389,445/A/
Application Number:
PAN: 8-048,373
Contract Number:
W-7405-ENG-48
Resource Relation:
Other Information: PBD: 14 Feb 1995
Research Org:
University of California
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; BORON; FABRICATION; TITANIUM; COMPOSITE MATERIALS; SPUTTERING; USES; THIN FILMS