Method of forming a leak proof plasma sprayed interconnection layer on an electrode of an electrochemical cell

Title: Method of forming a leak proof plasma sprayed interconnection layer on an electrode of an electrochemical cell

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Abstract

A dense, substantially gas-tight, electrically conductive interconnection layer is formed on an electrode structure of an electrochemical cell by: (A) providing an electrode structure; (B) forming on a selected portion of the electrode surface, an interconnection layer having the general formula La{sub 1{minus}x}M{sub x}Cr{sub 1{minus}y}N{sub y}O{sub 3}, where M is a dopant selected from the group of Ca, Sr, Ba, and mixtures thereof, and where N is a dopant selected from the group of Mg, Co, Ni, Al, and mixtures thereof, and where x and y are each independently about 0.075--0.25, by thermally spraying, preferably plasma arc spraying, a flux added interconnection spray powder, preferably agglomerated, the flux added powder comprising flux particles, preferably including dopant, preferably (CaO){sub 12}(Al{sub 2}O{sub 3}){sub 7} flux particles including Ca and Al dopant, and LaCrO{sub 3} interconnection particles, preferably undoped LaCrO{sub 3}, to form a dense and substantially gas-tight interconnection material bonded to the electrode structure by a single plasma spraying step; and (C) heat treating the interconnection layer at from about 1,200 to 1,350 C to further densify and heal the micro-cracks and macro-cracks of the thermally sprayed interconnection layer. The result is a substantially gas-tight, highly doped, electrically conductive interconnection material bondedmore »« less

Inventors:: Kuo, L J.H.; Vora, S D

Issue Date:: 1995-02-21

Research Org.:: Westinghouse Electric Corporation

OSTI Identifier:: 27707

Patent Number(s):: 5391440

Application Number:: PAN: 8-195,335

Assignee:: Westinghouse Electric Corp., Pittsburgh, PA (United States)

DOE Contract Number:: FC21-91MC28055

Resource Type:: Patent

Resource Relation:: Other Information: PBD: 21 Feb 1995

Country of Publication:: United States

Language:: English

Subject:: 30 DIRECT ENERGY CONVERSION; SOLID ELECTROLYTE FUEL CELLS; ELECTRODES; FABRICATION; COATINGS; PLASMA ARC SPRAYING; LANTHANUM OXIDES; CHROMIUM OXIDES; DOPED MATERIALS; CALCIUM OXIDES; STRONTIUM OXIDES; BARIUM OXIDES; MAGNESIUM OXIDES; COBALT OXIDES; NICKEL OXIDES; ALUMINIUM OXIDES; LANTHANUM COMPOUNDS; HEAT TREATMENTS; ELECTRIC CONDUCTIVITY

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                    Kuo, L J.H., and Vora, S D. Method of forming a leak proof plasma sprayed interconnection layer on an electrode of an electrochemical cell.  United States: N. p., 1995. 
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                    Kuo, L J.H., & Vora, S D. Method of forming a leak proof plasma sprayed interconnection layer on an electrode of an electrochemical cell.  United States.

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                    Kuo, L J.H., and Vora, S D. Tue .  
        "Method of forming a leak proof plasma sprayed interconnection layer on an electrode of an electrochemical cell".  United States.

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@article{osti_27707,

  title        = {Method of forming a leak proof plasma sprayed interconnection layer on an electrode of an electrochemical cell},

  author       = {Kuo, L J.H. and Vora, S D},

  abstractNote = {A dense, substantially gas-tight, electrically conductive interconnection layer is formed on an electrode structure of an electrochemical cell by: (A) providing an electrode structure; (B) forming on a selected portion of the electrode surface, an interconnection layer having the general formula La{sub 1{minus}x}M{sub x}Cr{sub 1{minus}y}N{sub y}O{sub 3}, where M is a dopant selected from the group of Ca, Sr, Ba, and mixtures thereof, and where N is a dopant selected from the group of Mg, Co, Ni, Al, and mixtures thereof, and where x and y are each independently about 0.075--0.25, by thermally spraying, preferably plasma arc spraying, a flux added interconnection spray powder, preferably agglomerated, the flux added powder comprising flux particles, preferably including dopant, preferably (CaO){sub 12}(Al{sub 2}O{sub 3}){sub 7} flux particles including Ca and Al dopant, and LaCrO{sub 3} interconnection particles, preferably undoped LaCrO{sub 3}, to form a dense and substantially gas-tight interconnection material bonded to the electrode structure by a single plasma spraying step; and (C) heat treating the interconnection layer at from about 1,200 to 1,350 C to further densify and heal the micro-cracks and macro-cracks of the thermally sprayed interconnection layer. The result is a substantially gas-tight, highly doped, electrically conductive interconnection material bonded to the electrode structure. The electrode structure can be an air electrode, and a solid electrolyte layer can be applied to the unselected portion of the air electrode, and further a fuel electrode can be applied to the solid electrolyte, to form an electrochemical cell for generation of electrical power. 4 figs.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1995},

  month        = {2}

}

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