Method of manufacturing proton selective membranes based on two dimensional materials
Abstract
Proton conductive membrane includes a proton selective layer of 80-100% carbon with sp2 hybridization having a thickness of 0.3-100 nm, with 0-20% of hydrogen, oxygen, nitrogen and sp3 carbon; wherein the sp2 carbon is in a form of graphene-like material; the proton selective layer having a plurality of pores formed by any of 7, 8, 9 or 10 sp2 carbon cycles or a combination thereof, with the pores having an effective diameter of up to 0.6 nm; an ionomeric polymer layer on the proton selective layer. Total thickness of the proton conductive membrane is less than 50 microns. The ionomeric polymer is PFSA (perfluorinated sulfonic acid), PVP (polyvinylpyrrolidone) or PVA (poly vinyl alcohol) with iodide or bromide counterion dissolved inside. The graphene-like material is CVD graphene or reduced graphene oxide (rGO). A D to G Raman band ratio of the membrane is more than 0.1.
- Inventors:
- Issue Date:
- Research Org.:
- NM Devices LLC, Las Cruces, NM (United States); General Graphene Corporation, Knoxville, TN (United States)
- Sponsoring Org.:
- USDOE Advanced Research Projects Agency - Energy (ARPA-E)
- OSTI Identifier:
- 2293923
- Patent Number(s):
- 11831039
- Application Number:
- 17/720,451
- Assignee:
- NM Devices LLC (Las Cruces, NM); General Graphene Corporation (Knoxville, TN); Chaturvedi, Pavan (Las Cruces, NM); Shinde, Dhanraj (Las Cruces, NM)
- DOE Contract Number:
- AR0000651
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 04/14/2022
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Smirnov, Sergei, Vlassiouk, Ivan, Chaturvedi, Pavan, and Shinde, Dhanraj. Method of manufacturing proton selective membranes based on two dimensional materials. United States: N. p., 2023.
Web.
Smirnov, Sergei, Vlassiouk, Ivan, Chaturvedi, Pavan, & Shinde, Dhanraj. Method of manufacturing proton selective membranes based on two dimensional materials. United States.
Smirnov, Sergei, Vlassiouk, Ivan, Chaturvedi, Pavan, and Shinde, Dhanraj. Tue .
"Method of manufacturing proton selective membranes based on two dimensional materials". United States. https://www.osti.gov/servlets/purl/2293923.
@article{osti_2293923,
title = {Method of manufacturing proton selective membranes based on two dimensional materials},
author = {Smirnov, Sergei and Vlassiouk, Ivan and Chaturvedi, Pavan and Shinde, Dhanraj},
abstractNote = {Proton conductive membrane includes a proton selective layer of 80-100% carbon with sp2 hybridization having a thickness of 0.3-100 nm, with 0-20% of hydrogen, oxygen, nitrogen and sp3 carbon; wherein the sp2 carbon is in a form of graphene-like material; the proton selective layer having a plurality of pores formed by any of 7, 8, 9 or 10 sp2 carbon cycles or a combination thereof, with the pores having an effective diameter of up to 0.6 nm; an ionomeric polymer layer on the proton selective layer. Total thickness of the proton conductive membrane is less than 50 microns. The ionomeric polymer is PFSA (perfluorinated sulfonic acid), PVP (polyvinylpyrrolidone) or PVA (poly vinyl alcohol) with iodide or bromide counterion dissolved inside. The graphene-like material is CVD graphene or reduced graphene oxide (rGO). A D to G Raman band ratio of the membrane is more than 0.1.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Nov 28 00:00:00 EST 2023},
month = {Tue Nov 28 00:00:00 EST 2023}
}