Innovative solutions for improving laser damage performance of multi-layer dielectric gratings
Abstract
Optical thin film designs are provided that achieve significantly improved laser damage thresholds and ultra-low-loss. These advances may be achieved by utilizing materials with electronic band gaps and refractive indices that are higher than those that are conventionally used.
- Inventors:
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 2293862
- Patent Number(s):
- 11815705
- Application Number:
- 16/698,555
- Assignee:
- Lawrence Livermore National Security, LLC (Livermore, CA)
- DOE Contract Number:
- AC52-07NA27344
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 11/27/2019
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Nguyen, Hoang T. Innovative solutions for improving laser damage performance of multi-layer dielectric gratings. United States: N. p., 2023.
Web.
Nguyen, Hoang T. Innovative solutions for improving laser damage performance of multi-layer dielectric gratings. United States.
Nguyen, Hoang T. Tue .
"Innovative solutions for improving laser damage performance of multi-layer dielectric gratings". United States. https://www.osti.gov/servlets/purl/2293862.
@article{osti_2293862,
title = {Innovative solutions for improving laser damage performance of multi-layer dielectric gratings},
author = {Nguyen, Hoang T.},
abstractNote = {Optical thin film designs are provided that achieve significantly improved laser damage thresholds and ultra-low-loss. These advances may be achieved by utilizing materials with electronic band gaps and refractive indices that are higher than those that are conventionally used.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2023},
month = {11}
}
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