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Title: Dislocation glide suppression for misfit dislocation free heteroepitaxy

Abstract

An epitaxial structure includes a semiconductor substrate, a dislocation blocking layer; and one or more active layers.

Inventors:
; ; ; ;
Issue Date:
Research Org.:
Univ. of California, Oakland, CA (United States)
Sponsoring Org.:
USDOE Advanced Research Projects Agency - Energy (ARPA-E)
OSTI Identifier:
2293795
Patent Number(s):
11804525
Application Number:
17/066,876
Assignee:
The Regents of the University of California (Oakland, CA)
DOE Contract Number:  
AR0000672
Resource Type:
Patent
Resource Relation:
Patent File Date: 10/09/2020
Country of Publication:
United States
Language:
English

Citation Formats

Bowers, John, Norman, Justin, Mukherjee, Kunal, Selvidge, Jennifer, and Hughes, Eamonn. Dislocation glide suppression for misfit dislocation free heteroepitaxy. United States: N. p., 2023. Web.
Bowers, John, Norman, Justin, Mukherjee, Kunal, Selvidge, Jennifer, & Hughes, Eamonn. Dislocation glide suppression for misfit dislocation free heteroepitaxy. United States.
Bowers, John, Norman, Justin, Mukherjee, Kunal, Selvidge, Jennifer, and Hughes, Eamonn. Tue . "Dislocation glide suppression for misfit dislocation free heteroepitaxy". United States. https://www.osti.gov/servlets/purl/2293795.
@article{osti_2293795,
title = {Dislocation glide suppression for misfit dislocation free heteroepitaxy},
author = {Bowers, John and Norman, Justin and Mukherjee, Kunal and Selvidge, Jennifer and Hughes, Eamonn},
abstractNote = {An epitaxial structure includes a semiconductor substrate, a dislocation blocking layer; and one or more active layers.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2023},
month = {10}
}

Works referenced in this record:

Non-radiative recombination at dislocations in InAs quantum dots grown on silicon
journal, September 2019


Compound semiconductor structures for optoelectronic devices
patent, May 2003