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Title: Method for sputtering with low frequency alternating current

Low frequency alternating current sputtering is provided by connecting a low frequency alternating current source to a high voltage transformer having outer taps and a center tap for stepping up the voltage of the alternating current. The center tap of the transformer is connected to a vacuum vessel containing argon or helium gas. Target electrodes, in close proximity to each other, and containing material with which the substrates will be coated, are connected to the outer taps of the transformer. With an applied potential, the gas will ionize and sputtering from the target electrodes onto the substrate will then result. The target electrodes can be copper or boron, and the substrate can be stainless steel, aluminum, or titanium. Copper coatings produced are used in place of nickel and/or copper striking. 6 figs.
Inventors:
Issue Date:
OSTI Identifier:
224985
Assignee:
Dept. of Energy, Washington, DC (United States) PTO; SCA: 360101; 360601; PA: EDB-96:079363; SN: 96001577511
Patent Number(s):
US 5,512,164/A/
Application Number:
PAN: 8-309,715
Contract Number:
AC02-76CH03073
Resource Relation:
Other Information: PBD: 30 Apr 1996
Research Org:
Princeton Univ., NJ (United States)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; COPPER; PHYSICAL VAPOR DEPOSITION; STAINLESS STEELS; VAPOR DEPOSITED COATINGS; ALUMINIUM; TITANIUM; BORON; SPUTTERING; ELECTRIC CURRENTS; ELECTRIC POTENTIAL