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Title: Thermal evaporation sources for wide-area deposition

Abstract

A thermal evaporation sources are described. These thermal evaporation sources include a crucible configured to contain a volume of evaporant and a vapor space above the evaporant.

Inventors:
;
Issue Date:
Research Org.:
National Renewable Energy Laboratory (NREL), Golden, CO (United States); JLN Solar, Inc., Mill Valley, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
2222245
Patent Number(s):
11739414
Application Number:
16/863,866
Assignee:
JLN Solar, Inc. (Mill Valley, CA)
DOE Contract Number:  
ADJ-1-30630-12
Resource Type:
Patent
Resource Relation:
Patent File Date: 04/30/2020
Country of Publication:
United States
Language:
English

Citation Formats

Birkmire, Robert W., and Hanket, Gregory M. Thermal evaporation sources for wide-area deposition. United States: N. p., 2023. Web.
Birkmire, Robert W., & Hanket, Gregory M. Thermal evaporation sources for wide-area deposition. United States.
Birkmire, Robert W., and Hanket, Gregory M. Tue . "Thermal evaporation sources for wide-area deposition". United States. https://www.osti.gov/servlets/purl/2222245.
@article{osti_2222245,
title = {Thermal evaporation sources for wide-area deposition},
author = {Birkmire, Robert W. and Hanket, Gregory M.},
abstractNote = {A thermal evaporation sources are described. These thermal evaporation sources include a crucible configured to contain a volume of evaporant and a vapor space above the evaporant.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2023},
month = {8}
}

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Thermal decomposition cell
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Method and apparatus for reactive plasma atomization
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Fabrication system and manufacturing method of light emitting device
patent-application, July 2004


Fabrication System, Light-emitting Device And Fabricating Method Of Organic Compound-containing Layer
patent-application, July 2004


Apparatus and method for metal plasma immersion ion implantation and metal plasma immersion ion deposition
patent-application, March 2005


Linear aperture deposition apparatus and coating process
patent-application, August 2001