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Title: Three dimensional vertically structured electronic devices

Abstract

In one embodiment, an apparatus includes at least one vertical transistor, where the at least one vertical transistor includes: a substrate comprising a semiconductor material, an array of three dimensional (3D) structures above the substrate, a gate region, and an isolation region positioned between the 3D structures. Each 3D structure includes the semiconductor material. Each 3D structure also includes a first region having a first conductivity type and a second region having a second conductivity type, the second region including a portion of at least one vertical sidewall of the 3D structure. The gate region is present on a portion of an upper surface of the second region and the gate region is coupled to a portion of the at least one vertical sidewall of each 3D structure.

Inventors:
; ; ; ;
Issue Date:
Research Org.:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
2222239
Patent Number(s):
11742424
Application Number:
17/143,972
Assignee:
Lawrence Livermore National Security, LLC (Livermore, CA)
DOE Contract Number:  
AC52-07NA27344
Resource Type:
Patent
Resource Relation:
Patent File Date: 01/07/2021
Country of Publication:
United States
Language:
English

Citation Formats

Conway, Adam, Harrison, Sara Elizabeth, Nikolic, Rebecca, Shao, Qinghui, and Voss, Lars. Three dimensional vertically structured electronic devices. United States: N. p., 2023. Web.
Conway, Adam, Harrison, Sara Elizabeth, Nikolic, Rebecca, Shao, Qinghui, & Voss, Lars. Three dimensional vertically structured electronic devices. United States.
Conway, Adam, Harrison, Sara Elizabeth, Nikolic, Rebecca, Shao, Qinghui, and Voss, Lars. Tue . "Three dimensional vertically structured electronic devices". United States. https://www.osti.gov/servlets/purl/2222239.
@article{osti_2222239,
title = {Three dimensional vertically structured electronic devices},
author = {Conway, Adam and Harrison, Sara Elizabeth and Nikolic, Rebecca and Shao, Qinghui and Voss, Lars},
abstractNote = {In one embodiment, an apparatus includes at least one vertical transistor, where the at least one vertical transistor includes: a substrate comprising a semiconductor material, an array of three dimensional (3D) structures above the substrate, a gate region, and an isolation region positioned between the 3D structures. Each 3D structure includes the semiconductor material. Each 3D structure also includes a first region having a first conductivity type and a second region having a second conductivity type, the second region including a portion of at least one vertical sidewall of the 3D structure. The gate region is present on a portion of an upper surface of the second region and the gate region is coupled to a portion of the at least one vertical sidewall of each 3D structure.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2023},
month = {8}
}

Works referenced in this record:

Three dimensional vertically structured MISFET/MESFET
patent, January 2021


Graded Heterojunction Nanowire Device
patent-application, May 2016